摘要
针对传统单磨头磁流变抛光技术的不足,提出了一种新的双磨头磁流变抛光方法,并研制了一台八轴数控双磨头磁流变抛光机,具备了大口径平面、非球面及连续位相板的超精密、高效率加工能力。分别研究了大、小磨头材料去除特性及面形修正能力,不仅获得了稳定、有效的大、小抛光斑,而且获得了超精的大、小平面工艺样件。50mm小平面经小磨头一次连续抛光,在45mm内其面形精度PV由0.21λ收敛至0.08λ、RMS由0.053λ收敛至0.015λ;430mm×430mm大平面经大磨头3次迭代抛光,在410mm×410mm内其面形精度PV由0.4λ收敛至0.1λ、RMS由0.068λ收敛至0.013λ。由此表明,所研制的双磨头磁流变抛光机床具有较好的材料去除特性和较强的面形修形能力。
Aiming at some deficiencies of traditional one-polishing-head magnetorheological fin-ishing (MRF) technique ,a new two-polishing-head MRF method was studied and a two-polis-hing-head computer controlled MRF machine with 8 axes was developed .The machine has the ability to produce large aperture flat ,asphere and continuous phase plate with high figure accu-racy and high material removal rate .Material removal characteristic and figure correction abil-ity for each of large and small polishing heads were studied .Each of two heads individually ac-quired stable and valid polishing removal function and ultra-precision flat sample .After a sin-gle polishing iteration using small polishing head ,the figure error peak value(PV) in 45 mm diameter of a 50 mm diameter small plano optics significantly improved from 0 .21 λ to 0 .08λ(0 .053λ to 0 .015 λ root-mean-square) .After three polishing iterations using large polishing head ,the figure error in 410 mm × 410 mm of a 430 mm × 430 mm large plano optics significant-ly improved from 0 .40λto 0 .10λPV (0 .068λto 0 .013λRMS) .These results show that the two-polishing-head MRF machine has good material removal stability and excellent figure cor-rection capability .
出处
《应用光学》
CAS
CSCD
北大核心
2014年第3期494-499,共6页
Journal of Applied Optics
基金
国家"高档数控机床与基础制造装备"科技重大专项课题资助(2013ZX04006011)
关键词
双磨头磁流变抛光
大口径连续位相板
材料去除特性
面形修正能力
two-polishing-head magnetorheological finishing
large-aperture continuous phase plate
material removal characteristic
figure correction ability
