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THERMODYNAMIC ANALYSIS AND EXPERIMENTAL VERIFICATION FOR SYNTHESIZING SILICON NITRIDE NANOPARTICLES USING RF PLASMA CVD 被引量:6

THERMODYNAMIC ANALYSIS AND EXPERIMENTAL VERIFICATION FOR SYNTHESIZING SILICON NITRIDE NANOPARTICLES USING RF PLASMA CVD
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摘要 Silicon nitride nanoparticles were synthesized by radio-frequency (RF) plasma chemical vapor deposi-tion (PCVD) using silicon tetrachloride and ammonia as precursors, and argon as carrier gas. By assuming chemical thermodynamic equilibrium in the system, a computer program based on chemical thermodynamics was used to cal-culate the compositions of the system at different initial concentrations and final temperatures. At first, five elements and thirty-four species were considered. The effects of temperatures, and concentrations of ammonia, hydrogen and nitrogen on the equilibrium compositions were analyzed. It was found that the optimal reaction temperature range should be 1200 to 1500 K to obtain the highest conversion and yield of Si3N4. The inlet position of ammonia should be lower than that of silicon tetrachloride, and both should be located at the tail of the plasma torch. The best mole ratio of ammonia to silicon tetrachloride was found to be about 6. Later, the influences of water (and oxygen) were considered, and 17 additional species were included in the computations. It was found that oxygen or water content in the raw materials should be as low as possible in order to have high nitride content in the produced Si3N4. Nitrogen or hydrogen might be used to replace some or even all the argon to improve the yield of silicon nitride and reduce the cost. The ratio of ammonia to silicon tetrachloride should be high enough to obtain high conversion, but not exces-sively high to reduce the oxygen content due to the existence of water in ammonia. The simulated results were veri-fied by experiments. Silicon nitride nanoparticles were synthesized by radio-frequency (RF) plasma chemical vapor deposi-tion (PCVD) using silicon tetrachloride and ammonia as precursors, and argon as carrier gas. By assuming chemical thermodynamic equilibrium in the system, a computer program based on chemical thermodynamics was used to cal-culate the compositions of the system at different initial concentrations and final temperatures. At first, five elements and thirty-four species were considered. The effects of temperatures, and concentrations of ammonia, hydrogen and nitrogen on the equilibrium compositions were analyzed. It was found that the optimal reaction temperature range should be 1200 to 1500 K to obtain the highest conversion and yield of Si3N4. The inlet position of ammonia should be lower than that of silicon tetrachloride, and both should be located at the tail of the plasma torch. The best mole ratio of ammonia to silicon tetrachloride was found to be about 6. Later, the influences of water (and oxygen) were considered, and 17 additional species were included in the computations. It was found that oxygen or water content in the raw materials should be as low as possible in order to have high nitride content in the produced Si3N4. Nitrogen or hydrogen might be used to replace some or even all the argon to improve the yield of silicon nitride and reduce the cost. The ratio of ammonia to silicon tetrachloride should be high enough to obtain high conversion, but not exces-sively high to reduce the oxygen content due to the existence of water in ammonia. The simulated results were veri-fied by experiments.
出处 《China Particuology》 SCIE EI CAS CSCD 2003年第4期162-167,共6页
关键词 silicon nitride radio-frequency (RF) PLASMA CVD NANOPARTICLE silicon nitride, radio-frequency (RF), plasma, CVD, nanoparticle
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  • 1N. Rao,S. Girshick,J. Heberlein,P. McMurry,S. Jones,D. Hansen,B. Micheel.Nanoparticle formation using a plasma expansion process[J].Plasma Chemistry and Plasma Processing.1995(4) 被引量:1
  • 2Yl Chang,P. Kong,E. Pfender.Characterization of silicon nitride particles synthesized in an atmospheric-pressure convection-stabilized arc[J].Plasma Chemistry and Plasma Processing.1989(1) 被引量:1
  • 3R. M. Young,E. Pfender.Generation and behavior of fine particles in thermal plasmas—A review[J].Plasma Chemistry and Plasma Processing.1985(1) 被引量:1
  • 4P. Ronsheim,A. Mazza,A. N. Christensen.Thermal plasma synthesis of transition metal nitrides and alloys[J].Plasma Chemistry and Plasma Processing.1981(2) 被引量:1

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