Electroluminescence Spectrum Shift with Switching Behavior of Diamond Thin Films
被引量:1
参考文献19
-
1Zhang Y F et al 2001 Chin Phys Lett. 18 286. 被引量:1
-
2Zhang H D et al 2002 Chin Phys Lett. 19 1695. 被引量:1
-
3Wang X P et al 2002 Chin Phys Lett. 19 717. 被引量:1
-
4Taniguchi Y et al 1989 Jpn J Appl Phys. 28 L1848. 被引量:1
-
5Kadano M et al 1990 Mater Res Soc Symp Proc. 162 359. 被引量:1
-
6Zhang B L et al 1994 Chin Phys Lett. 11 235. 被引量:1
-
7Shen S Pet al 1993 Chin Sci Bull. 38 382. 被引量:1
-
8Wang X P et al 1997 Chin Phys Lett. 14 772. 被引量:1
-
9Mnfredotti C et al 1995 Aprl Phys Lett. 67 3376. 被引量:1
-
10Zhang B L et al 1996 Chin Phys Lett. 13 455. 被引量:1
同被引文献2
-
1符史流,柴飞,陈洁,张汉焱.Ce^(4+)离子在Ca_2SnO_4一维结构基质中的电荷迁移光谱研究[J].物理学报,2008,57(5):3254-3259. 被引量:8
-
2雷通,王小平,王丽军,吕承瑞,章诗,朱玉传.Electroluminescence from Multilayered Diamond/CeF3/SiO2 Films[J].Chinese Physics Letters,2010,27(4):231-233. 被引量:2
-
1王小平,王丽军,等.Electroluminescence of Boron and Nitrogen Doped Diamond Thin Films[J].Chinese Physics Letters,2002,19(5):717-719.
-
2张劲松,任兆杏,梁荣庆,隋毅峰,刘卫.Study of SiO_2 Films Prepared by Electron CyclotronResonant Microwave Plasma[J].Plasma Science and Technology,2000,2(2):199-205.
-
3唐靓,叶慧琪,肖东.YAG:Ce3+-Yb3+荧光粉的量子剪裁及上转换过程[J].光学学报,2014,34(13):341-344.
-
4李全国.周期扰动下一类反应扩散系统的渐近稳定性[J].暨南大学学报(自然科学与医学版),2007,28(5):445-446.
-
5邵明宪.从一个定理的别证谈起[J].中学数学教学,2005(6):26-27.
-
6WANG Ye-Shuai XIA Nian-Ming ZUO Hua-Kun SHEN Yi-Ning XIA Zheng-Cai.Switching Behavior Induced by Electric and Magnetic Fields in (La0.73Bi0.27)0.67Ca0.33MnO3[J].Chinese Physics Letters,2014,31(4):159-162.
-
7尹增谦,万景瑜,黄明强,王慧娟.介质阻挡放电中的能量转换过程研究[J].物理学报,2007,56(12):7078-7083. 被引量:3
-
8汤敏燕,徐闰,高永超,王林军.Valence band offsets of the strained and longitudinally relaxed diamond/c-BN superlattices[J].Journal of Shanghai University(English Edition),2011,15(3):218-222.
-
9王喜章,吴强,胡征,徐华,苗水,陈懿.A Multifunctional Microwave Plasma Reaction Apparatus and its Applications[J].Plasma Science and Technology,2000,2(4):405-410.
-
10Daohui Xiang,Ming Chen,Yuping Ma,Fanghong Sun.Adhesive strength of CVD diamond thin films quantitatively measured by means of the bulge and blister test[J].Journal of University of Science and Technology Beijing,2008,15(4):474-479.
;