摘要
提出一种分析微波等离子体化学气相沉积工艺条件对金刚石薄膜的组成和光学性质影响的方法。采用红外椭圆偏振光谱仪来分析Si衬底上金刚石薄膜的组成和光学性质 ,研究微波等离子体化学气相沉积法生长条件和退火工艺对金刚石薄膜的消光系数和折射率的影响。实验表明金刚石薄膜中存在C -H、C =C、O -H和C =O键 ,生长条件对薄膜中C -H和C =C键的含量及薄膜的折射率影响较大 ;薄膜经过退火后薄膜的光学性质得到明显改善。
A technology of analyzing composition and optical properties of the diamond film deposited by MPCVD method is developed. Using infrared spectroscopic ellipsometer (IRSE) to analyze the composition and optical properties of the diamond film on Si substrate, the effect of different conditions of deposition process and annealing on the optical properties of the diamond film is studied. Experiments indicate that there are C-H bond, C-C bond, 0-H bond and C=O bond in the diamond film. The growth conditions have an important effect on the content of C-H bond and C-C bond and refractive index of the diamond film. After annealing an obvious improvement of the optical properties of the diamond film is found.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2003年第8期989-992,共4页
Acta Optica Sinica
基金
国家自然科学基金 (6 0 2 770 2 4 )
上海市科委重点项目
上海市青年科技启明星项目
上海市教委发展基金资助课题
