摘要
利用直流磁控溅射方法,以Ar/N2作为放电气体,通过改变放电气体中N2的流量(N2流量比分别为5%,10%,30%,50%)及溅射时间(160,30,20,10,5min),在玻璃衬底上沉积了FexN薄膜。用X射线光电子能谱(XPS)方法确定了不同N2流量下薄膜的成分;X射线衍射(XRD)方法分析了不同N2流量下的FexN薄膜结构,当N2流量比为5%时获得了FeN0 056相,10%时为ε Fe3N相,30%和50%流量比下均得到FeN相。利用原子力显微镜(AFM)和掠入射X射线散射(GIXA)方法研究了膜表面的粗糙度和形貌,发现随着N2流量的增加,薄膜表面光滑度增加,薄膜表面呈现自仿射性质。动力学标度方法定量分析表明:薄膜表面因不同N2流量的影响而具有不同的动力学指数,当氮气流量比为5%时,静态标度指数α≈0 65,生长指数β≈0 53±0 02,薄膜生长符合基于Kolmogorov提出的能量波动概念的KPZ模型指数规律。
Iron nitride films have received attention for many years. Initially, they have been studied because of their ability to improve surface hardness and wear resistance. Recently, the FeN thin films have been widely investigated since they show a variety of structures and magnetic properties. All nitrides with the composition of FexN (x≥3) are ferromagnetic and stable at room temperature. In particular, α″Fe16N2 phase is the most important compound and can be a possible candidate for highdensity magnetic recording media owing to its very high magnetic moment even higher than that of pure iron. However, up to now, little research has been done to investigate the dynamical scaling behavior of iron nitride films sputtered on glass to determine its universality class although dynamic scaling may be a useful method for understanding the formation of structure of the thin films. There are three types of growth morphologies: layer by layer growth, unstable growth, and selfaffine surface. Solid films grown under far from equilibrium conditions are predicted to have selfaffine surfaces, and the roughness can be characterized by appealing to a dynamic form. Moreover, the KPZ equation has proven to be a universal equation for real surface growth phenomena only on the basis of computer simulations. There is nearly no unambiguous experimental demonstration of KPZ growth. In this study, we deposited iron nitride thin films by DC magnetron sputtering at mixed Ar/N2 discharges(N2 fraction of 5%,10%,30%,50%, respectively) and different times(160,30,20,10,5min) in order to study their kinetic scaling behavior. The composition of the films was analyzed using Xray photoelectron spectroscopy experiment (XPS). The layer phases and surface morphology of the films were characterized using grazing incidence Xray scattering and Xray diffraction as well as atomic force microscopy. For the film grown at N2 fraction of 30% and 50%, the phase of Fe
出处
《发光学报》
EI
CAS
CSCD
北大核心
2003年第4期431-434,T002,共5页
Chinese Journal of Luminescence
