摘要
微电子技术的发展一直是光刻设备和技术发展与变革的动力。通过介绍光刻机的演变和所面临的挑战,揭示下一代光刻设备的发展潜力,结合比较极紫外光刻机和电子束曝光机的开发现状和特点,预言将来以极紫外光刻机、电子束曝光机和某种常规光刻机结合,来实现工业需要的各种图形的制备。
The development of microelectronics has been driving the lithography development. The optical lithography tool evolution and the challenge for it to follow the Moor's law are reviewed. Then we show the potential of the Next Generation Lithography. The future technology would be a kind of combination of traditional lithography, Extreme Ultraviolet Lithography and Electron Beam Lithography by comparing the advantage and disadvantage of each lithography tool.
出处
《微细加工技术》
2003年第2期1-5,11,共6页
Microfabrication Technology
基金
中国科学院"引进国外杰出人才"2001年资助项目
关键词
光刻机
发展趋势
极紫外光刻机
电子束曝光机
微电子技术
Next Generation Lithography(EGL)
Extreme Ultraviolet Lithography(EUVL)
Electron Beam Lithography
microelectronics
