摘要
本文研究了用直流磁控溅射技术在 75～ 15 0 μm的镍基合金微粒表面包覆 10 μm左右的金属铬涂层的方法 ,讨论了工艺的影响和涂层的性能 ,指出利用直流磁控溅射技术可在镍基合金微粒表面获得均匀、完整的厚铬涂层 。
The paper has studied the way to coat Cr films thickness:～10μm on the Ni-alloys particles (75～150μm) by using D.C magnetron sputtering technology. The effect of processing parameters and the properties of the coatings have been discussed. The results show that coating is pure chromium while original vacuum is less than 10 -2 Pa. The structure of coatings is porous column cone-shaped grains with vaulted top if the vacuum is higher than 0.5-0.1 Pa when sputtering. The way of particle movement in the depositing space affects the uniformity and integrity of the particle surface coatings, and so do the key depositing parameters for the adhesion of the coatings. It is pointed out that the technology is suitable for formation of uniform thick Cr films (≥10μm)on the particles and that pretreatment and subsequent treatment of the particles is important for the adhesion of the coatings to the particles.
出处
《粉末冶金技术》
CAS
CSCD
北大核心
2003年第1期22-26,共5页
Powder Metallurgy Technology
基金
核燃料及材料国家级重点实验室基金 5 14810 80 10 1SC0 10 1资助
关键词
镍基合金
微粒
PVD
涂层
直流磁控溅射
铬
Ni-alloys
particles
coatings
D.C magnetron sputtering
Chromium
