摘要
在电子级超纯水的生产过程中,痕量H_(2)O_(2)主要由真空紫外线降解器产生的羟基自由基复合而成,会影响半导体材料清洗的某些特定工艺。将复相纳米催化技术应用于电子级超纯水制备系统,可以有效去除超纯水中微污染H_(2)O_(2),是促进含O—O键活性氧物种快速解离的绿色清洁技术。简要阐述了微污染H_(2)O_(2)的产生及对半导体材料清洗工艺的影响,着重分析了Ⅷ族过渡元素中铂系金属纳米粒子对H_(2)O_(2)催化解离的反应途径和作用机理。还讨论了金属表面吸附构型、吸附能、电子结构以及载体化学性质、水中卤族阴离子等因素对纳米粒子强化去除特性的影响,综述了Ⅷ族过渡金属在超纯水生产、检测以及半导体工艺辅助系统的应用与研究进展,为超纯水新型反应体系的构建和水处理材料的研发及应用提供参考。
In the production process of electronic grade ultrapure water,trace H_(2)O_(2) is mainly compounded by hydroxyl radicals generated by vacuum UV degradation devices,which can corrode certain specific processes of semiconductor materials surface cleaning.The application of multiphase nanocatalysation technology in advanced process semiconductor ultrapure water preparation system can effectively remove the micropollution H_(2)O_(2) produced by vacuum ultraviolet irradiation,which is a green cleaning technology to promote the rapid dissociation of active oxygen species containing O—O bonds.The generation of micropollution H_(2)O_(2) and its influence on the cleaning process of semiconductor materials were briefly discussed.The reaction pathway and mechanism of platinum series metal nanoparticles in groupⅧtransition elements to catalyze H_(2)O_(2) dissociation were analyzed.The effects of metal surface adsorption configuration,adsorption energy,electronic structure,carrier chemical properties,halogen anions in water and other factors on the enhanced removal characteristics of nanoparticles were also discussed.The application and research progress of groupⅧtransition metals in ultrapure water production,detection and semiconductor assisted process systems were reviewed.The research provided reference for the construction of a new reaction system in ultrapure water process and the development and application of water treatment materials.
作者
郑伟
王文龙
倪卫斌
温鑫
杨光明
ZHENG Wei;WANG Wenlong;NI Weibin;WEN Xin;YANG Guangming(China Electronics Engineering Design Institute Co.,Ltd.,Beijing 100142,China;Tsinghua Shenzhen International Graduate School,Tsinghua University,Shenzhen 518055,China;OVIVO Water Technology(China)Co.,Ltd.,Shanghai 201203,China)
出处
《工业水处理》
CAS
CSCD
北大核心
2024年第7期57-66,共10页
Industrial Water Treatment
关键词
电子级超纯水
微污染控制
金属纳米粒子
分解活性
electronic grade ultrapure water
micropollution control
metal nanoparticles
decomposition activity
