摘要
具有表面润湿特性的大高径比纳米结构在诸多领域有广泛的应用,如液滴的微流控输运等。然而,大高径比纳米结构的低成本制造具有一定的挑战性。为此,采用二氧化硅纳米粒子自组装制备的薄膜及线条阵列的掩蔽干法刻蚀工艺,通过调节Bosch工艺刻蚀步数,实现了高径比从2∶1至几十比一的硅纳米结构。以纳米粒子薄膜和纳米粒子线条阵列作为掩蔽层进行刻蚀制备的硅纳米阵列结构表面分别展示了各向同性和各向异性的表面润湿特性。实验结果表明,随着刻蚀步数的增加,表面润湿特性发生从Wenzel亲水状态向Cassie-Baxter疏水状态的转变,同时各向异性的静态接触角和滑动角呈逐渐减小趋势。另外,纳米墙阵列结构表面展现了近似于荷叶效应的超疏水特性,前进接触角达到160°以上,而滑动角小于5°,利用具有不同粘附特性的表面,可以实现液滴从低粘附表面向高粘附表面转移。
Large aspect-ratio nanostructures with surface wetting properties can be widely used in many fields,such as microfluidic transport of the liquid drops.However,the low-cost fabrication of Large aspect-ratio nanostructures faces certain challenges.Hence,with the masked dry etching process for the thin-film and stripes array fabricated by the silica nanoparticles assembly,and through adjusting the etching steps of Bosch process,silicon nanostructures with aspect-ratio range from 2∶1 to tens to one were achieved.With the nanoparticles thin film and nanoparticle stripe array as the masked layer,silicon nanoarray structures were fabricated by etching process,the surface of which exhibits isotropic and anisotropic surface wetting properties,respectively.The experimental results show that as the etching steps increase,the surface wetting properties transform from Wenzel hydrophilic state to Cassie-Baxter hydrophobic state,meanwhile,the anisotropic static contact angles and sliding angles tend to decrease gradually.In addition,the surface of nano-walled array structures reveals superhydrophobic properties similar to lotus effect,with an advancing contact angle of more than 160°and a rolling angle less than 5°.By using the surfaces with different adhesive properties,the liquid droplets can be transformed from low adhesion surfaces to high adhesion surfaces.
作者
黎相孟
魏慧芬
张雅君
Li Xiangmeng;Wei Huifen;Zhang Yajun(Shanxi Key Laboratory of Advanced Manufacturing Technology,North University of China,Taiyuan 030051,China)
出处
《微纳电子技术》
CAS
2024年第4期170-178,共9页
Micronanoelectronic Technology
基金
国家自然科学基金(51705479)
山西省科技合作交流专项项目(202204041101006)
山西省基础研究计划(20210302123013,202203021222077,202203021212148)。
