摘要
为研究杂质大小对增透膜激光损伤阈值(LIDT)影响,利用光刻技术在熔石英基底表面设置厚度为100nm不同直径大小的柱状金属Al“杂质吸收点”,然后在此基础上沉积增透膜。通过Comsol模拟仿真了解损伤过程,并利用532nm纳秒激光器进行阈值测试,对实验数据与样品损伤形貌进行分析,结果表明杂质直径为50um、100um、200um、300um、400um的薄膜损伤阈值分别为18.93J/cm^(2),18.62J/cm^(2),17.11J/cm^(2),15.28J/cm^(2),13.47J/cm^(2),呈非线性下降,“杂质吸收点”吸收光能产生热量,传导于增透膜层后产生的轴向热应力超过了薄膜的拉伸强度是膜层损伤的主因。
To study the influence of impurity size on the damage threshold of anti-reflection film,by using photolithography technology,cylindrical Al impurities with different diameters and thickness of 100nm were added between the fused quartz and the anti-reflection film.Comsol was used to understand the damage process,and the 532nm nanosecond laser was used for threshold test,then the experimental data and the sample damage morphology are analyzed,the results show that the damage thresholds of the films with impurity diameters of 50um,100um,200um,300um and 400um are respectively 18.93J/cm^(2),18.62J/cm^(2),17.11J/cm^(2),15.28J/cm^(2),13.47J/cm^(2),which goes down nonlinearly,and the main cause of film damage is that the"impurity absorption point"absorbs laser energy to generate heat,and the axial thermal stress generated by conduction to the anti-reflection film exceeds the tensile strength of the film.
作者
章汪维
朱华新
胡立发
刘涛
陈晓家
郭东铭
ZHANG Wangwei;ZHU Huaxin;HU Lifa;LIU Tao;CHEN Xiaojia;GUO Dongming(School of Science,Jiangnan University,Wuxi 214122,China;Jiangsu Province Research Center of Light Industry Optoelectronic Engineering and Technology Research,Wuxi 214122,China)
出处
《光学技术》
CAS
CSCD
北大核心
2024年第1期24-29,共6页
Optical Technique
基金
国家自然科学基金青年基金(61605067)
江苏省轻工光电工程技术研究中心(BM2014402)。
关键词
增透膜
杂质诱导
薄膜损伤阈值
anti-reflection film
impurity induction
film damage threshold
