摘要
为解决用于钙钛矿SnO_(2)电子传输层镀膜工艺的原子层沉积(ALD)设备存在的镀膜均匀性问题,基于计算流体力学(CFD)仿真软件Fluent,从流场的角度对设备反应腔体进行了分析。根据流场分析的结果,进行了反应室结构优化设计。并通过工艺试验,验证了流场的改善对镀膜均匀性有明显帮助作用;对ALD设备流场分析及相关设备的设计优化具有一定参考意义。
In order to solve the coating uniformity problem of Atomic Layer Deposition(ALD)equipment used in the perovskite SnO_(2) electron transport layer coating process,the reaction chamber of the equipment is analyzed from the perspective of flow field based on Computational Fluid Dynamics(CFD)simulation software fluent.Based on the results of flow field analysis,the reaction chamber structure was optimized and designed.And through process experiments,it was verified that the improvement of the flow field has a significant helpful effect on the uniformity of the coating.The research in this article has certain reference significance for the flow field analysis of ALD equipment and the design optimization of related equipment.
作者
雷睿
谢国杨
成秋云
LEI Rui;XIE Guoyang;CHENG Qiuyun(Hunan Red Solar Photoelectricity Science and Technology Co.,Ltd.,Changsha 410205,China;National Photovoltaic Equipment Engineering Technology Research Center,Changsha 410205,China)
出处
《电子工业专用设备》
2023年第5期15-21,95,共8页
Equipment for Electronic Products Manufacturing
关键词
原子层沉积
计算流体力学
钙钛矿
镀膜均匀性
Atomic layer deposition
Computational fluid dynamics
Perovskite
Coating uniformity
