摘要
目的研究国内外新型222 nm远紫外光源的消毒效果,为后续远紫外线消毒技术研究与应用提供数据支撑。方法使用UVS-200紫外空间辐射分布测试系统对3种远紫外光源进行光谱测定,采用载体定量杀菌试验对不同光源进行消毒效果研究。结果不带滤片国产光源在222 nm处有一个峰值外,在230-240 nm内还有一个小峰值,带滤片国产和日本光源均只有222 nm一个峰值。带滤片国产光源在辐射剂量为1215 mJ/cm^(2)时,对布片上污染的大肠埃希菌和金黄色葡萄球菌杀灭率达到99.9%,对玻片上污染的大肠埃希菌和金黄色葡萄球菌杀灭率只达到90%;不带滤片国产光源杀菌效果要好于带滤片国产光源;带滤片国产光源对布片上污染的大肠埃希菌杀灭效果要好于带滤片日本光源。结论在相同的辐射剂量下,带滤片国产222 nm远紫外光源对布片上污染的微生物杀灭效果好于玻片;带滤片国产222 nm远紫外光源对布片上污染的大肠埃希菌的杀菌效果要好于带滤片日本光源。
Objective To study the disinfection effect of a new domestic and foreign 222 nm far-UVC radiation,and to provide date support for the subsequent research and application of ultravionlet disinfection technology.Methods The UVS-200 ultraviolet spatial radiation distribution testing system was used to measure the spectra of three light sources,and the carrier quantitative sterilization test was used to study the disinfection effect of different ligst sources.Results In addition to a peak at 222 nm,the domestic light source without filter also had a small peak in 230-240 nm.The domestic and Japanese light sources with filter only had one peak at 222 nm.When the radiation dose of the domestic light source with filter was 1215 mJ/cm^(2),the killing rate of Escherichia coli and Staphylococcus aureus contaminated on the cloth reached 99.9%,and the killing rate of Escherichia coli and Staphylococcus aureus contaminated on the glass slide was only 90%;the disinfection effect of domestic light source without filter was better than that of domestic light source with filter;the killing effect of domestic light source with filter on Escherichia coli contaminated on the cloth was better than that of Japanese light source with filter.Conclusion Under the same radiation dose the domestic 222 nm far-UVC light source with filter has a better killing effect on microorganisms contaminated on cloth than on glass slide;the domestic 222 nm far-UVC light source with filter has a better killing effect on Escherichia coli contaminated on cloth than Japanese light source with filter.
作者
韩杰
沙斯烁
李锦
许春
邵子轩
任哲
张雪
魏秋华
HAN Jie;SHA Si-shuo;LI Jin;XU Chun;SHAO Zi-xuan;REN Zhe;ZHANG Xue;WEI Qiu-hua(Chinese PLA Center for Disease Control and Prevention,Beijing 100071;Beijing Shouliang Technology Co.,Ltd.;Tianjin Medical University,China)
出处
《中国消毒学杂志》
CAS
2023年第10期721-724,共4页
Chinese Journal of Disinfection
