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1310nm InGaAsP多结激光电池

1310 nm InGaAsP Multi-Junction Laser Power Converters
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摘要 针对现有1 310 nm激光电池(LPC)的低输出电压难以满足电子器件供电需求的问题,采用多结叠层结构设计,制备了六结InGaAsP 1 310 nm LPC并进行了测试。测试结果表明,在功率密度为57.5 W/cm^(2)的激光照射下,六结LPC的光电转换效率为31.0%,开路电压(Voc)超过3.6 V,实现了高的输出电压。六结LPC的短路电流随温度的升高而降低,当激光功率密度为13.25 W/cm^(2)时,Voc的温度系数为-9.61 mV/K。复合电流严重影响LPC的填充因子和光电转换效率,利用双二极管模型拟合了变温I-V曲线,研究了内部参数与温度的变化关系,表明陷阱辅助隧穿过程是导致LPC高复合电流的主要原因。 Aiming at the problem that the low output voltage of the existing 1310 nm laser power converter(LPC)is difficult to meet the power supply requirements of electronic devices,a six-junction InGaAsP 1310 nm LPC was fabricated by using a multi-junction stack structure design and was tested.The test results show that at a laser power density of 57.5 W/cm²,the photoelectric conversion efficiency of the six-junction LPC is 31.0%,and the open circuit voltage(V_(oc))exceeds 3.6 V,achieving high output voltage.The short-circuit current of the six-junction LPC decreases with the increase of temperature.When the laser power density is 13.25 W/cm^(2),the temperature coefficient of V_(oc) is-9.61 mV/K.Recombination current seriously affects the fill factor and photoelectric conversion efficiency of the LPC.The temperature-dependent I-V curves was fitted by using the two-diode model,and the relationship between the internal parameters and temperature was studied,indicating that the trap-assisted tunneling process is the main reason for the high recombination current of the LPC.
作者 秦杰 孙玉润 于淑珍 王安成 尹佳静 董建荣 Qin Jie;Sun Yurun;Yu Shuzhen;Wang Ancheng;Yin Jiajing;Dong Jianrong(School of Nano-Tech and Nano-Bionics,University of Science and Technology of China,Hefei 230026,China;Key Laboratory of Nano Devices and Applications,Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China)
出处 《半导体技术》 CAS 北大核心 2023年第8期658-664,共7页 Semiconductor Technology
基金 国家自然科学基金资助项目(62275262)。
关键词 激光电池(LPC) 多结叠层 1310 nm 复合电流 陷阱辅助隧穿 laser power converter(LPC) multi-junction stack 1310 nm recombination current trap-assisted tunneling
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  • 1杨俊,赵有文,董志远,邓爱红,苗杉杉,王博.深能级缺陷对半绝缘InP材料电学补偿的影响[J].物理学报,2007,56(2):1167-1171. 被引量:3
  • 2萨支唐.固态电子学基础[M].上海:复旦大学出版社,2003. 被引量:2
  • 3Chow T P, Tyagi R. Wide bandgap compound semiconductors for superior high-voltage unipolar power devices[J]. IEEE Trans. on Electron Devices, 1994, 41(8):1481-1483. 被引量:1
  • 4Casey H C, Muth Jr J, Krishnankutty S, et al. Dominance of tunneling current and band filling in InGaN/AlGaN double heterostructure blue light-emitting diodes[J]. Appl. Phys. Lett.,1996, 68 (20):2867-2869. 被引量:1
  • 5Perlin P, Osiski M , Eliseev P G , et al. Low-temperature study of current and electrolumineseence in InGaN/AlGaN/GaN double-heterostructure blue light-emittingdiodes[J]. Appl. Phys. Lett., 1996, 69(12):1680-1682. 被引量:1
  • 6Chitnis A,Kumar A, Shatalov M, et al. High-quality p-n junctions with quaternary AlInGaN/InGaN quantum wells[J]. Appl. Phys. Lett., 2000, 77 (23):3800-3802. 被引量:1
  • 7RL-Y S,Noyce R N, Shockley W. Carrier generation and recombination in p-n junctions and p-n junction characteristics[J]. Proc. of the IRE, 1957, 45 (9):1228-1243. 被引量:1
  • 8Riben A R,Feucht D L. nGe-pGaAs Heterojunctionst [J]. Solid-State Electron., 1966, 9(11):1055-1065. 被引量:1
  • 9Wright A F, Grossner U. The effect of doping and growth stoichiometry on the core structure of a threading edge dislocation in GaN[J]. Appl. Phys. Lett. , 1998, 73(19):2751-2753. 被引量:1
  • 10Cao X A, LeBoeuf S F, Kim K H, et al. Investigation of radiative tunneling in GaN/InGaN single quantum well light-emitting diodes[J]. Solid- State Electron. , 2002, 46(12):2291-2294. 被引量:1

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