摘要
文章介绍了一种基于OMRON CP1H PLC为控制器的半导体生产用真空吸引控制系统的设计,提出了以PLC为核心控制器的系统架构组成方案,重点分析了多台真空泵循环控制的可靠性实现原理。传统负压吸引真空泵常用电接点真空压力表配合继电器控制,控制系统结构复杂,设备体积庞大,难于修改控制参数和实现复杂的控制逻辑,控制系统的可靠性难于保证,需要人为定期巡检,极易因设备故障而影响真空吸引供气的连续可靠性。针对常用的电接点真空压力表控制系统存在的不足,本次研究方案采用PLC控制的负压吸引真空泵控制系统,硬件结构简单,PLC结合触摸屏具有可编程复杂控制逻辑、易于远程监控、易于修改参数、运行可靠性高的特点,以此来确保半导体生产用真空吸引供气系统的运行可靠性,为半导体生产用真空吸引系统供气压力的连续可靠性提供了保证。
The article introduces the design of a vacuum suction control system for semiconductor production based on OMRON CP1H PLC as the controller,provides a system architecture composition scheme with PLC as the core controller,and focuses on analyzing the reliability implementation principle of multiple vacuum pump cycle control.Traditional negative pressure suction vacuum pumps commonly use electric contact vacuum pressure gauges with relay control.The control system structure is complex,the equipment volume is large,and it is difficult to modify control parameters and achieve complex control logic.The reliability of the control system is difficult to ensure,and regular human inspections are required.Otherwise,it is easy to affect the continuous reliability of vacuum suction gas supply due to equipment failure.In response to the shortcomings of commonly used electric contact vacuum pressure gauge control systems,this project adopts a PLC controlled negative pressure suction vacuum pump control system with a simple hardware structure.The combination of PLC and touch screen has the characteristics of programmable complex control logic,easy remote monitoring,easy parameter modification,and high operational reliability,in order to ensure the operational reliability of the vacuum suction gas supply system for semiconductor production and provide a guarantee for the continuous reliability of the gas supply pressure of the vacuum suction system for semiconductor production.
出处
《今日自动化》
2023年第5期10-13,共4页
Automation Today
