摘要
具有多层结构特征的微纳结构在新型显示、半导体、MEMS等领域具有广阔的应用前景。现有的干涉测量相位解析方法如白光干涉、光谱干涉利用多层反射光与参考光的干涉信息实现多层三维重构。然而,当介质层数较多时,相邻介质层的干涉信号严重影响测量精度,且在大台阶、高曲率等复杂结构检测中具有许多局限性。基于结构光调制度解析的测量方法以其非接触、高精度、高适应性等特点在复杂微纳结构检测领域中占有重要地位。将结构光调制度测量原理应用于多层结构同步三维重构,通过对不同的介质层成像,进而解析出不同层结构的调制度分布,最后实现多层结构及其厚度分布同步三维测量。
Micro/nano structures with multilayer features have been widely applied in the fields of display,semiconductor,MEMS.The existing methods based on phase analysis of interferogram including white-light interferometry and spectral interferometry utilize the phase information of interferogram formed by multilayer reflected light and reference light to achieve multilayer three-dimensional reconstruction.However,when the number of dielectric layers is large,the interference signals of adjacent dielectric layers will interfere each other,which seriously affect the measurement accuracy.Also,there are various limitations in the measurement of complex structures with large steps and high curvatures.The measurement method based on the modulation evaluation of structured light is a unique way in the field of complex micronano structure measurement due to its non-contact,high precision,high adaptability.The principle of structured light to synchronously realize the three-dimensional reconstruction of multi-layer structure is applied in this paper.By imaging different dielectric layers,the modulation degree distribution of different layer structures is analyzed,and finally the multilayer structure and its thickness distribution are synchronously measured in three dimensions.
作者
谢仲业
孙敬华
李波瑶
陈晓涌
肖涵
XIE Zhong-ye;SUN Jing-hua;LI Bo-yao;CHEN Xiao-yong;XIAO Han(School of Electronic Engineering and Intelligence,Dongguan University of Technology,Dongguan 230009,China)
出处
《光学与光电技术》
2022年第4期62-65,共4页
Optics & Optoelectronic Technology
关键词
微纳结构
三维重构
结构光
调制度
多层结构
micro nano structure
three-dimensional reconstruction
structured light
modulation
multilayer structure
