摘要
集成电路的发展至今已有60余年,对更为强大性能芯片的追求使得芯片制造技术不断迭代升级。长期以来,基于紫外光源投影曝光光刻的芯片制造方法是大规模集成电路制造的唯一选择。然而,随着极紫外光刻机进入产线应用和不断性能优化,芯片制造已经进入了7 nm及以下节点。对于摩尔定律是否可以持续、极紫外光刻能否支撑未来芯片需求等问题,学术界和工业界均未形成一致的意见和具有共识的下一代光刻技术路线。相对基于极紫外投影曝光式的第五代光刻机,本文提出基于双光束超分辨技术的第六代光刻机概念,并从多个角度论述基于双光束超分辨的第六代光刻机技术的优势和潜力,同时也讨论了该技术存在的难点以及可能的解决方法。作为不同于紫外光刻技术路线的一种可替代技术路线,双光束超分辨光刻机技术将极有可能引领未来芯片制造。
Integrated circuit has been invented for more than 60 years,and the pursuit of more powerful performance chips makes the chip manufacturing technology constantly iterate and upgrade.For a long time,chip fabrication methods based on the ultraviolet lithographic projection system have been the only option for large-scale integrated chip fabrication.However,with the extremely ultraviolet lithography applied into the production line and optimized performance,chip manufacturing is advanced to the 7 nm and the following node.Academia and industry are not consensus of whether Moore’s law can last and extremely ultraviolet lithography can support the future chip demand.The next generation of lithography technology route is still undiscovered.Compared with the fifth generation lithography based on extreme ultraviolet projection exposure,this paper proposes the concept of the sixth generation lithographic system based on dual-beam super resolution technology,and discusses the advantages and potential of the sixth generation lithographic system based on dual-beam super resolution technology,and also discusses the difficulties and possible solutions.As an alternative technology different from the ultraviolet lithography technology,the dual-beam super resolution lithography will probably lead the future of chip manufacturing.
作者
骆志军
刘紫玉
王舒虹
王端
甘棕松
杜炘瑶
Luo Zhijun;Liu Ziyu;Wang Shuhong;Wang Duan;Gan Zongsong;Du Xinyao(Wuhan National Laboratory for Optoelectronics,Huazhong University of Science and Technology,Wuhan 430074,Hubei,China;Key Laboratory of Information Storage System Ministry of Education of China,Huazhong University of Science and Technology,Wuhan 430074,Hubei,China;Research Institute of Huazhong University of Science and Technology in Shenzhen,Shenzhen 518057,Guangdong,China)
出处
《激光与光电子学进展》
CSCD
北大核心
2022年第9期454-469,共16页
Laser & Optoelectronics Progress
基金
国家自然科学基金面上项目(61775068)
国家重点研发计划(2021YFB2802000)
深圳市科技创新委员会基金(JCYJ20180507184503128)
武汉市东湖高新区人才经费
华中科技大学学术前沿青年团队资助、华中科技大学科研启动经费。
关键词
光刻机
双光束
超分辨
投影
芯片制造
lithography
dual-beam
super resolution
projection
chip manufacturing
