期刊文献+

氮化镓HEMT器件辐射效应综述

Review of radiation effects on GaN HEMT devices
下载PDF
导出
摘要 在高频、大功率、高温、高压等领域,氮化镓高电子迁移率晶体管(HEMT)器件因其优异的耐辐射性能而被广泛地应用于卫星、太空探测、核反应堆等领域。尽管从理论和一些试验研究中可以得知,氮化镓材料具有良好的耐辐射特性,但在实际应用中,因其制作工艺及结构等因素的影响,氮化镓HEMT器件的耐辐射特性受到了很大的影响和挑战。本文介绍了氮化镓HEMT器件几种辐射效应,并对氮化镓HEMT器件辐射的研究进行了综述。 GaN High Electron Mobility Transistor(HEMT)devices have superior advantages in highfrequency,high-power,high-temperature and high-pressure applications,and due to the excellent radiation resistance characteristics of gallium nitride materials,the devices are useful in radiation environments such as satellites,space exploration,and nuclear reactors.Although the theory and some existing experimental results have shown that GaN materials have excellent radiation resistance properties,in actual situations,the radiation resistance properties of GaN HEMT devices are greatly affected and challenged due to the influence of the device manufacturing process and structure.The major radiation effects of GaN HEMT devices are discussed,and the radiation research of GaN HEMT devices is reviewed.
作者 吕航航 曹艳荣 马毛旦 张龙涛 任晨 王志恒 吕玲 郑雪峰 马晓华 LYU Hanghang;CAO Yanrong;MA Maodan;ZHANG Longtao;REN Chen;WANG Zhiheng;LYU Ling;ZHENG Xuefeng;MA Xiaohua(School of Electro-Mechanical Engineering,Xidian University,Xi'an Shaanxi 710071,China;State Key Subject Laboratory of Wide Band Gap Semiconductor Technology,Xidian University,Xi'an Shaanxi 710071,China)
出处 《太赫兹科学与电子信息学报》 2022年第6期535-542,564,共9页 Journal of Terahertz Science and Electronic Information Technology
基金 北京智芯微电子科技有限公司实验室开放基金项目 国家自然科学基金资助项目(11690042,U1866212,12035019,61727804,11690040)
关键词 氮化镓HEMT器件 γ射线辐射 质子辐射 中子辐射 电子辐射 GaN HEMT devices Gamma irradiation proton irradiation neutron irradiation electron irradiation
  • 相关文献

参考文献5

二级参考文献63

  • 1范隆 李培咸 张进城 等.A1GaN/GaN HEMTs器件辐射感生缺陷的影响分析[J].半导体学报,. 被引量:1
  • 2Khan M A, Bhattarai A, Kuznia J N and Olson D T 1993 Appl. Phys. Lett. 63 1214 被引量:1
  • 3Wang X L, Cheng T S, Ma Z Y, Hu G X, Xiao H L, Run J X, Wang C M and Luo W J 2007 Solid State Electron. 51 428 被引量:1
  • 4Cai S J, Tang Y S, Li R, Wei Y Y, Wong L, Chen Y L, Wang K L, Chen M, Zhao Y F, Schrimpf R D, Keay J C and Galloway K F 2000 IEEE Trans. Electron Devices 47 304 被引量:1
  • 5Gaudreau F, Fournier P, Carlone C, Khanna Shyam M, Tang H P, Webb J and Houdayer A 2002 IEEE Trans. Nucl.Sci. 49 2702 被引量:1
  • 6Sonia G, Brunner F, Denker A, Lossy R, Mai M, Opitz- Coutuieau J, Pensl G, Richter E, Schmidt J, Zeimer U, Wang L, Weyers M, Wurfl J and Trankle G 2006 IEEE Trans. Nucl. Sci. 53 3661 被引量:1
  • 7Polyakov A Y, Smirnov N B, Govokov A V, Markov A V, Pearton S J, Kolin N G, Merkurisov D I and Boiko V M 2005 J. Appl. Phys. 98 033529 被引量:1
  • 8Umana-Membreno G A, Dell J M, Parish G, Nener B D, Faraone L, Ventury R and Mishra U K 2005 Phys. Status Solidi C 2 2581 被引量:1
  • 9L Hsu and W Walukiewicz 2001 J. Appl. Phys. 89 1783 被引量:1
  • 10Kuriyama K, Tokumasu T, Takahashi Jun, Kondo H, and Okada M 2002 Appl. Phys. Lett. 80 3328 被引量:1

共引文献11

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部