期刊文献+

基于光刻胶超构透镜的研究 被引量:2

Research on photoresist metalens
原文传递
导出
摘要 超构透镜已经成为当前纳米光子领域的研究热点之一。与传统的由TiO_(2)、Si或GaN等高折射率介电质材料组成的超构透镜不一样,文章创新性的提出了一种由新型非高折射率材料光刻胶组成的Pancharatnam-Berry(PB)相位型超构透镜。通过时域有限差分数值模拟软件(FDTD Solutions)对所设计的结构进行数值模拟仿真,仿真结果表明:光刻胶超构透镜在可见光波段500~700nm的峰值聚焦效率为58%以及在近红外波段700~900nm的峰值聚焦效率为52%。结果证明了使用非高折射率材料构成的超构透镜也可以实现较好的光场聚焦性能,突破了基于高成本的电子束刻蚀方法设计和加工超构透镜的限制,为未来超构透镜的应用拓展出更广阔的发展空间。 Metalens has gained research interest in the field of nanophotonics.Contrary to the traditional metalens composed of high refractive index dielectric material such as TiO_(2),Si,or GaN,the authors propose a Pancharatnam-Berry(PB)Phase-type metalens.All the numerical simulations of the designed structure were performed through finite-difference time-domain software(FDTD Solutions).The simulation results validate that the peak focusing efficiency of the photoresist metalens in the visible light band i.e.500~700 nm is 58%while in the near-infrared band i.e.700~900 nm,the peak focusing efficiency is 52%.The results validate that the metalens made of non-high refractive index materials can also achieve better-focusing performance.It overcome the limitations of designing and processing metalens based on high-cost electron beam etching methods and is a great future for metalens.The applications of the metalens expand a broader space for development.
作者 彭嘉 陆咏诤 文静 PENG Jia;LU Yongzheng;WEN Jing(School of Optical-Electrical and Computer Engineering,University of Shanghai for Science and Technology,Shanghai 200093,China)
出处 《光学技术》 CAS CSCD 北大核心 2022年第2期166-170,共5页 Optical Technique
基金 国家重点研发计划(2018YFA0701800) 国家自然科学基金(NSFC,62175153,61775140)。
关键词 超构透镜 光刻胶 聚焦效率 metalens photoresist focusing efficiency
  • 相关文献

参考文献1

共引文献7

同被引文献16

引证文献2

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部