摘要
全氟丁二烯(六氟丁二烯,六氟-1,3-丁二烯,C_(4)F_(6),HFBD)是一种性能优异的新一代电子工业用蚀刻气,应用前景广阔。HFBD的合成工艺多样,基本上都是采用偶联法、脱卤法和格氏试剂法。原料中含有的主要杂质除氮气(N_(2))、氧气(O_(2))等不凝性气体能用精馏法轻松脱除外,其它的杂质均可以用吸附法脱除。通过使用沸石类分子筛、活性氧化铝、碳分子筛、硅铝酸盐分子筛、碱盐等进行吸附实验,能将HFBD产品中的氟化氢(HF)、水分(H_(2)O)、含有丁二烯的氟氯化物、丁烯的二聚体、少量的醇及醚等杂质均脱除到符合电子特气出货标准。实验结果表明,大部分吸附剂会引发不同程度的歧化反应,精制难度较大,故选用碱盐分子筛脱除HF,硅铝酸盐分子筛脱除醚,5 A分子筛脱除其余杂质。
Perfluorobutadiene(hexafluorobutadiene,hexafluoro-1,3-butadiene,C4F6,HFBD)is a new generation of excellent etching gas for electronic industry,which has a wide application prospect.HFBD is synthesized by a variety of processes,basically using coupling method,dehalogenation method and grignard reagent method.In addition to nitrogen(N_(2)),oxygen(O_(2)),and other non-condensable gases,which can be easily removed by distillation,the rest of the main impurities in the raw material can be removed by adsorption.Through the adsorption experiment,the impurities in HFBD such as hydrogen fluoride(HF),moisture(H_(2)O),fluorine chloride containing butadiene,dimer of Butene,small amount of alcohol and ether,can be removed to comply with the electronic special gas shipping standards by the use of zeolite-like molecular sieves,activated alumina,carbon molecular sieves,aluminosilicate molecular sieves,alkali salts and other adsorbents.The results show that most of the adsorbents can induce disproportionation reaction in different degree,and it is difficult to refine the adsorbents.Therefore,HF is removed by alkali salt molecular sieve,ether is removed by aluminosilicate molecular sieve and other impurities are removed by 5A molecular sieve.
作者
袁淑筠
禹金龙
韦杰广
YUAN Shujun;YU Jinlong;WEI Jieguang(Guangdong Huate Gases Co. , Ltd. , Foshan 528241, China)
出处
《低温与特气》
CAS
2022年第1期34-37,共4页
Low Temperature and Specialty Gases
