摘要
大气压等离子体射流阵列下游工作区的不均一性问题是一个亟待解决的难题。本文以四根出口直径为10μm的玻璃微针作为发生器主体,设计了一种线型He/O_(2)微射流阵列;重点研究施加电压对等离子体电学、光学以及聚合物薄膜改性效果的影响,并分析了不均一性产生的可能原因。实验表明:该射流阵列具有气体温度低、活性强等优点,薄膜处理后表面改性效果明显;等离子体发光强度、气体温度、O含量以及改性后薄膜表面O/C比例均随施加电压增加而增加;但发现过低或过大电压均会影响各射流之间的均一性,该现象可能与各射流间的空间电场分布以及库伦作用力有关,通过合理调节施加电压可使得各射流处理效果获得较好的均一性。
The non-uniformity in the downstream area of the atmospheric plasma jet array is an urgent prob-lem to be solved.In this paper,we propose a linear He/O_(2) microplasma jet array based on four micropipettes withan exit diameter of 10μm.The effects of applied voltage on the uniformity of plasma characteristics and modifica-tion effects of polymer films were investigated,and the possible causes of the non-uniformity were discussed.Re-sults show that the jet array has the advantages of low temperature and high reactivity,and the surface modificationeffect of the polymer film is obvious.The luminous intensity,gas temperature,the concentration of O atoms and theO/C ratio all increased with higher applied voltage.But the applied voltage with too low or too large amplitude willaffect the spatial uniformity of the jet array,and this phenomenon might result from the non-uniformity of spatialelectric field distribution and Coulomb force among the multi-jets.The uniformity of the modification area can beimproved by adjusting the applied voltage.
作者
王涛
汪加豪
王圣泉
吕栎
时礼平
李蒙
涂德浴
刘景全
WANG Tao;WANG Jiahao;WANG Shengquan;LV Li;SHI Liping;LI Meng;TU Deyu;LIU Jingquan(School of Mechanical Engineering,Anhui University of Technology,Ma'anshan 243032,China;AnHui Province Key Laboratory of Special Heavy Load Robot,Ma'anshan 243032,China;Department of Micro/Nano Electronics,Shanghai Jiao Tong University,Shanghai 200240,China)
出处
《真空科学与技术学报》
CAS
CSCD
北大核心
2021年第10期1001-1008,共8页
Chinese Journal of Vacuum Science and Technology
基金
国家自然科学基金项目(51905002)
安徽省自然科学基金项目(2008085QE230)
安徽省高校自然科学研究重点项目(KJ2019A0057,KJ2019A0078)
特种重载机器人安徽省重点实验室开放基金(TZJQR003-2021)。
关键词
等离子体射流阵列
放电特性
光谱特性
薄膜改性
均一性
Plasma jet array
Discharge characteristics
Optical properties
Film modification
Uniformity