摘要
Here we present an easy one-step approach to pattern uniform catalyst lines for the growth of dense,aligned parallel arrays of single-walled carbon nanotubes(SWNTs)on quartz wafers by using photolithography or polydimethylsiloxane(PDMS)stamp microcontact printing(μCP).By directly doping an FeCl3/methanol solution into Shipley 1827 photoresist or polyvinylpyrrolidone(PVP),various catalyst lines can be well-patterned on a wafer scale.In addition,during the chemical vapor deposition(CVD)growth of SWNTs the polymer layers play a very important role in the formation of mono-dispersed nanoparticles.This universal and effi cient method for the patterning growth of SWNTs arrays on a surface is compatible with the micro-electronics industry,thus enabling of the fabrication highly integrated circuits of SWNTs.
基金
by the Army Research Office and the Office of Naval Research.
