摘要
为了研究磁约束聚变装置支撑装置紧固件的螺母和螺栓表面防咬死涂层的均匀性,利用磁控溅射技术在管形器件的内表面和外表面制备了铜膜,应用台阶仪进行薄膜厚度测试。采用矩形铜板作为磁控溅射靶,采用单自转和公转加自转两种方式进行沉积,分析了铜膜在管形器件的内表面和外表面的膜厚分布规律。结果表明:无论螺母还是螺栓,公转加自转相对于单自转制备薄膜的均匀性都更好,随着孔(管)径的变小薄膜厚度变大。
To study the uniformity of the anti-seizing coating on the surface of the nuts and bolts of the supporting devices for the magnetic confinement fusion devices, copper films were prepared on the inner and outer wall of the cylindrical device by magnetron sputtering technology. The thickness of the films was measured by the step meter. A rectangular copper block was used as the magnetron sputtering target. The single rotation and revolution plus rotation were used to deposit copper films. The film thickness distribution on the inner wall and the outer wall of the cylindrical devices was analyzed. The results show that the uniformity of the films prepared by revolution plus rotation is better than that by single rotation. The thickness of the films increases with the decrease of the pore(tube) size.
作者
王坤
王世庆
李建
但敏
陈伦江
WANG Kun;WANG Shi-qing;LI Jian;DAN Min;CHEN Lun-jiang(Southwestern Institute of Physics,Chengdu 610041,China;Neijiang Normal University,Neijiang 641100,China)
出处
《真空》
CAS
2021年第1期67-71,共5页
Vacuum
基金
国家自然科学基金青年基金项目(11805058)
内江师范学院校级重点项目(2020ZD010)。
关键词
磁控溅射
核聚变
均匀性
防咬死
管内壁
管外壁
magnetron sputtering
nuclear fusion
uniformity
anti-seizing
tube inner wall
tube outer wall
