摘要
采用磁控溅射技术在石英衬底上制备氧化镓(Ga2O3)薄膜,研究溅射过程中不同氩氧比对薄膜晶体结构、表面形貌、粗糙度、拉曼光谱以及紫外探测性能等的影响。利用X射线衍射仪、扫描电子显微镜、原子力显微镜、拉曼光谱仪和紫外-可见分光光度计等测试仪器对氧化镓薄膜进行表征分析。实验结果表明,氧化镓薄膜呈现β型晶体结构,薄膜表面晶粒尺寸均匀;溅射过程中加入氧气可以有效减少氧化镓薄膜中的氧空位缺陷,适当增大氧氩比可有效提高薄膜质量和薄膜对紫外光的探测能力。
Gallium oxide(Ga2O3)thin films are fabricated on quartz substrates by magnetron sputtering.The influence of different argon-oxygen ratios during deposition on the film crystal structure,surface morphology,roughness,Raman spectroscopy and ultraviolet detection performance are investigated by scanning electron microscope,X-ray diffraction,atomic force microscope,Raman spectrometer and ultraviolet-visible spectrophotometer.Experimental results show that the gallium oxide film presents aβ-type structure and the particles on the surface of the film are uniform.Sputtering in an oxygen environment can effectively reduce the oxygen vacancy defects in the gallium oxide film.Increasing the oxygen-argon ratio can effectively improve the quality of the film and the ability of the film to detect ultraviolet light.
作者
商世广
王睿
张文倩
高浪
刘有耀
SHANG Shiguang;WANG Rui;ZHANG Wenqian;GAO Lang;LIU Youyao(School of Electronic Engineering,Xi'an University of Posts and Telecommunications,Xi'an 710121,China)
出处
《西安邮电大学学报》
2020年第3期45-49,共5页
Journal of Xi’an University of Posts and Telecommunications
基金
国家自然科学基金项目(61874087,61634004)。
关键词
氧化镓
磁控溅射
紫外探测
gallium oxide
magnetic sputtering
UV detection
