摘要
目前制造的准直器多为单孔结构且孔径较大,且少量多孔准直器结构均匀性差、尺寸精度低,导致准直效果差。研究使用电子束曝光技术在镀有铬金属层和PMMA胶层的石英玻璃表面进行曝光,探究了抗蚀剂厚度、曝光剂量、显影时间对曝光效果的影响。经过大量实验并合理化参数后,曝光出线宽为5μm、周期为120μm的光栅图形。使用湿法刻蚀技术将胶层图形结构转移到石英玻璃上,探究刻蚀温度、刻蚀液配比对刻蚀效果的影响。发现在刻蚀温度30℃、刻蚀液为氢氟酸、盐酸和氟化铵的混合液条件下,最终在石英玻璃表面刻蚀出线宽13.265μm、深度4.049μm的槽结构。采用激光对刻蚀出槽结构的玻璃进行等大小切割并将切割好的玻璃进行结合,可获得具有一定深宽比、结构均匀的准直器结构。
The collimators manufactured are mostly single-hole structures with large apertures,a small number of porous collimators have problems such as poor structural uniformity and low dimensional accuracy,which lead to poor collimation effect.This experiment main explores the exposure of quartz glass surface coated with chrome metal layer and PMMA adhesive layer based on electron beam lithography(EBL)technology,explores the effects of resist thickness,exposure dose,development time on the exposure effect.After a lot of experiments and rationalization of the parameters,the final exposure is a raster pattern with a line width of 5μm and a period of 120μm.The wet etching technique is used to transfer the pattern of the adhesive layer to the quartz glass and explore the effect of etching temperature and etching ratio on the etching effect.At the etching temperature of 30℃,the etching solution is a mixture of hydrofluoric acid,hydrochloric acid and ammonium fluoride,a groove structure with a line width of 13.265μm and a depth of 4.049μm is etched on the surface of the quartz glass.Equal-size cutting of glass etched out of the grating structure by laser and combine the cut glass to obtain a collimator structure with a certain aspect ratio and uniform structure.
作者
王俊
刘善敏
武晓光
汪炜
WANG Jun;LIU Shanmin;WU Xiaoguang;Wang Wei(College of Mechanical and Electrical Engineering,Nanjing University of Aeronautics and Astronautics,Nanjing 210016,China;Microsatellite Innovation Institute and Chinese Academy of Sciences,Shanghai 201210,China)
出处
《电加工与模具》
2020年第S01期68-73,78,共7页
Electromachining & Mould
