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Ferromagnetic MnSn Monolayer Epitaxially Grown on Silicon Substrate

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摘要 Two-dimensional(2D)ferromagnetic materials have been exhibiting promising potential in applications,such as spintronics devices.To grow epitaxial magnetic films on silicon substrate,in the single-layer limit,is practically important but challenging.In this study,we realized the epitaxial growth of Mn Sn monolayer on Si(111)substrate,with an atomically thin Sn/Si(111)-231/2×231/2-buffer layer,and controlled the Mn Sn thickness with atomic-layer precision.We discovered the ferromagnetism in Mn Sn monolayer with the Curie temperature(Tc)of^54 K.As the Mn Sn film is grown to 4 monolayers,Tc increases accordingly to^235 K.The lattice of the epitaxial Mn Sn monolayer as well as the Sn/Si(111)-231/2×231/2 is perfectly compatible with silicon,and thus an sharp interface is formed between Mn Sn,Sn and Si.This system provides a new platform for exploring the 2D ferromagnetism,integrating magnetic monolayers into silicon-based technology,and engineering the spintronics heterostructures.
作者 Qian-Qian Yuan Zhaopeng Guo Zhi-Qiang Shi Hui Zhao Zhen-Yu Jia Qianjin Wang Jian Sun Di Wu Shao-Chun Li 袁茜茜;郭照芃;石志强;赵辉;贾振宇;王前进;孙建;吴镝;李绍春(National Laboratory of Solid State Microstructures,School of Physics,Nanjing University,Nanjing 210093,China;Collaborative Innovation Center of Advanced Microstructures,Nanjing University,Nanjing 210093,China;Jiangsu Provincial Key Laboratory for Nanotechnology,Nanjing University,Nanjing 210093,China)
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2020年第7期115-119,共5页 中国物理快报(英文版)
基金 supported by the National Natural Science Foundation of China(Grant Nos.11774149,11790311,11574133,and 11834006) the National Key R&D Program of China(Grant Nos.2016YFA0300404,2015CB921202,and 2014CB921103)。
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