摘要
氧化铌作为一种重要的氧化物薄膜材料在可见到中波红外波段广泛应用。基于电子束加热蒸发方法,研究了不同温度条件下一定厚度的氧化铌薄膜的微观结构及特性,通过Kim振动模型拟合不同工艺条件下氧化铌的光学常数色散分布,采用X射线衍射仪(X-Ray Diffraction,XRD)测试薄膜的结晶态,并用原子力显微镜(Atomic Force Microscope,AFM)检测薄膜表面粗糙度,分析温度对膜层表面粗糙度的影响规律。
Niobium oxide as an important oxide film material has been widely used in visible-medium infrared waveband.In this paper,the optical properties and microstructure of a certain thickness yttrium oxide thin film under different process conditions were studied by electron beam heating evaporation method.The optical constant dispersion distribution of yttrium oxide under different process conditions was fitted by Kim vibration model.The crystal state of yttrium oxide thin film under different conditions was tested by X-Ray Diffraction(XRD);and the roughness of the film layer was detected by atomic force microscope Atomic Force Microscope(AFM);the influence of temperature on the surface roughness of the film was theoretically analyzed according to the test results;and the experimental data and test results were provided.
作者
王野
付秀华
张静
刘冬梅
WANG Ye;FU Xiu-hua;ZHANG Jing;LIU Dong-mei(School of Optoelectronic Engineering,Changchun University of Science and Technology,Changchun 130022)
出处
《长春理工大学学报（自然科学版）》
2020年第3期42-48,共7页
Journal of Changchun University of Science and Technology(Natural Science Edition)
基金
吉林省重大科技攻关专项(20190302095GX)。
