摘要
为研究基于喷射状态的无掩模定域性电沉积的最佳工艺参数,采用COMSOL Multiphysics仿真软件和实验研究无掩模定域性电沉积三维微结构过程中电流密度、极间距、脉冲占空比对沉积部件表面形貌和沉积速率的影响。结果表明,电流密度对沉积部件形貌、晶粒尺寸、内部气孔和沉积速率有很大影响,当电流密度超过4.5 A/dm^2,表面形貌和气孔急剧变差;占空比越小,定域性越好,沉积的圆柱直径越小,极间距为5μm时,可得到均匀的沉积层。通过正交实验优化得到的工艺参数为:电流密度3.5 A/dm^2,极间距5μm,占空比10%。
In order to study the optimal process parameters of mask-less localized electrodeposition based on jet state,COMSOL Multiphysics simulation software and experiment were used to study the effects of current density,interelectrode gap,pulse duty ratio on the surface morphology and deposition rate of the deposition parts in the process of 3D microstructures without mask.The analysis results showed that the current density had a great influence on the morphology,grain size,internal pores and deposition rate of the deposition parts.When the current density exceeded 4.5 A/dm^2,the surface morphology and pores dramatically deteriorated;the smaller the duty cycle,the better the localization;the smaller the diameter of the deposited cylinder,and the more uniform the sedimentation layer can be obtained when the polar spacing was 5μm.The process parameters obtained by orthogonal experiment optimization were:current density 3.5 A/dm^2,pole spacing of 5μm,pulse duty-ratio of 10%.
作者
吴建辉
吴蒙华
佐姗姗
钱宁开
WU Jianhui;WU Menghua;ZUO Shanshan;QIAN Ningkai(School of Mechanical Engineering,Dalian University,Dalian 116622,China)
出处
《材料导报》
EI
CAS
CSCD
北大核心
2020年第S01期427-432,共6页
Materials Reports
基金
国家自然科学基金(51875071)。
关键词
定域性电沉积
无掩模
多物理场仿真
三维微结构
localized electrodeposition
mask-less
multi-physical field simulation
3D microstructure
