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Preparation of ZrC-SiC composite coatings by chemical vapor deposition and study of co-deposition mechanism

Preparation of ZrC-SiC composite coatings by chemical vapor deposition and study of co-deposition mechanism
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摘要 In this work, the Zr C-SiC composite coatings were co-deposited by chemical vapor deposition(CVD)using ZrCl4, MTS, CH4 and H2 as raw materials. The morphologies, compositions and phases of the composite coatings were characterized by scanning electron microscopy(SEM), energy dispersive X-ray spectroscopy(EDS) and X-ray diffraction(XRD). The results indicated that the morphologies, compositions and phases of the composite coatings were related to the deposition temperature, the flow rate of the carrier H2 gas, and the ratio of C/Zr. Moreover, the co-deposition mechanism of the composite coatings was also studied. It was found that different deposition temperatures resulted in different deposition mechanisms. At temperatures in the range of 1150–1250℃, the Zr C-SiC co-deposition was controlled by the surface kinetic process. At temperatures in the range of 1250–1400℃, the Zr C-SiC co-deposition was controlled by the mass transport process. In this work, the Zr C-SiC composite coatings were co-deposited by chemical vapor deposition(CVD)using ZrCl4, MTS, CH4 and H2 as raw materials. The morphologies, compositions and phases of the composite coatings were characterized by scanning electron microscopy(SEM), energy dispersive X-ray spectroscopy(EDS) and X-ray diffraction(XRD). The results indicated that the morphologies, compositions and phases of the composite coatings were related to the deposition temperature, the flow rate of the carrier H2 gas, and the ratio of C/Zr. Moreover, the co-deposition mechanism of the composite coatings was also studied. It was found that different deposition temperatures resulted in different deposition mechanisms. At temperatures in the range of 1150–1250?C, the Zr C-SiC co-deposition was controlled by the surface kinetic process. At temperatures in the range of 1250–1400?C, the Zr C-SiC co-deposition was controlled by the mass transport process.
出处 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2019年第12期2942-2949,共8页 材料科学技术(英文版)
关键词 Chemical vapor deposition(CVD) Zirconium carbide Silicon carbide Composite coatings Co-deposition mechanism Chemical vapor deposition (CVD) Zirconium carbide Silicon carbide Composite coatings Co-deposition mechanism
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