摘要
以硫酸镍(NiSO4)和钨酸钠(Na2WO4·2H2O)为原料,采用低温化学浴沉积法在ITO导电玻璃上制备NiO和WO3电致变色薄膜,并通过物理方法制备WO3-NiO电致变色器件。本文探索了溶液的浓度和pH对薄膜沉积的影响。采用低温化学浴沉积法直接制备的薄膜为Ni(OH)2。实验结果表明当溶液浓度为0.02~0.5 M,pH在9.6~11.6之间,均可以得到致密、均匀的Ni(OH)2薄膜。其中,当硫酸镍浓度在0.05 M、pH调至11.3时能得到致密均匀且透过率高的氢氧化镍薄膜。该薄膜退火后可转化为NiO。当Na2WO4·2H2O溶液浓度在0.02 M至0.06 M,pH为1.2时,能得到致密均匀的WO3薄膜。此外,钨酸钠浓度在0.06 M且pH调至1.2时,得到致密均匀透过率高的WO3薄膜。将NiO-WO3薄膜组装成器件后光学调制为28%左右,能得到所需的电致变色器件。
Nickel sulfate(NiSO4)and sodium tungstate(Na2WO4·2H2O)were used as raw materials to prepare electrochromic films of NiO and WO3 on ITO conductive glass by low temperature chemical bath deposition.WO3-NiO electrochromic devices were prepared by physical method.The effects of solution concentration and pH on film deposition were investigated.The film prepared by low temperature chemical bath deposition is Ni(OH)2.The experimental results showed that when the concentration of solution was 0.02 M to 0.5 M and the pH was between 9.6 and 11.6,dense and uniform Ni(OH)2 films can be obtained.Moreover,when the concentration of nickel sulfate was 0.05 M and the pH was adjusted to 11.3,a dense,uniform and high transmittance nickel hydroxide film can be obtained.The film can be transformed into NiO after annealing.When the concentration of Na2WO4·2H2O solution was from 0.02 M to 0.06 M and the pH was 1.2,a dense and uniform WO3 film can be obtained.Furthermore,when the concentration of sodium tungstate was 0.06 M and the pH was adjusted to 1.2,a compact and uniform WO3 film with high transmittance was obtained.When NiO-WO3 thin films are assembled into devices,the optical modulation is about 28%,and the electrochromic devices we need can be obtained.
作者
李解
曹镜宇
张浩强
LI Jie;CAO Jingyu;ZHANG Haoqiang(School of Material and Chemical Engineering,Anhui Jian Zhu University,Hefei AnHui 230601,China)
出处
《阜阳师范学院学报（自然科学版）》
2020年第1期35-41,共7页
Journal of Fuyang Normal University(Natural Science)
基金
安徽省教育厅自然科学研究项目(KJ2016A819)资助。
