期刊文献+

Absorption and emission modulation in a MoS2–GaN(0001) heterostructure by interface phonon–exciton coupling

Absorption and emission modulation in a MoS2–GaN(0001) heterostructure by interface phonon–exciton coupling
原文传递
导出
摘要 Semiconductor heterostructures based on layered two-dimensional transition metal dichalcogenides(TMDs)interfaced to gallium nitride(Ga N)are excellent material systems to realize broadband light absorbers and emitters due to their close proximity in the lattice constants.The surface properties of a polar semiconductor such as Ga N are dominated by interface phonons,and thus the optical properties of the vertical heterostructure are influenced by the coupling of these carriers with phonons.The activation of different Raman modes in the heterostructure caused by the coupling between interfacial phonons and optically generated carriers in a monolayer MoS_2–Ga N(0001)heterostructure is observed.Different excitonic states in MoS_2 are close to the interband energy state of intraband defect state of Ga N.Density functional theory(DFT)calculations are performed to determine the band alignment of the interface and revealed a type-I heterostructure.The close proximity of the energy levels and the excitonic states in the semiconductors and the coupling of the electronic states with phonons result in the modification of carrier relaxation rates.Modulation of the excitonic absorption states in MoS_2 is measured by transient optical pump-probe spectroscopy and the change in emission properties of both semiconductors is measured by steady-state photoluminescence(PL)emission spectroscopy.There is significant red-shift of the C excitonic band and faster dephasing of carriers in MoS_2.However,optical excitation at energy higher than the bandgap of both semiconductors slows down the dephasing of carriers and energy exchange at the interface.Enhanced and blue-shifted PL emission is observed in MoS_2.Ga N band-edge emission is reduced in intensity at room temperature due to increased phonon-induced scattering of carriers in the Ga N layer.Our results demonstrate the relevance of interface coupling between the semiconductors for the development of optical and electronic applications. Semiconductor heterostructures based on layered two-dimensional transition metal dichalcogenides(TMDs) interfaced to gallium nitride(Ga N) are excellent material systems to realize broadband light absorbers and emitters due to their close proximity in the lattice constants. The surface properties of a polar semiconductor such as Ga N are dominated by interface phonons, and thus the optical properties of the vertical heterostructure are influenced by the coupling of these carriers with phonons. The activation of different Raman modes in the heterostructure caused by the coupling between interfacial phonons and optically generated carriers in a monolayer MoS2–Ga N(0001) heterostructure is observed. Different excitonic states in MoS2 are close to the interband energy state of intraband defect state of Ga N. Density functional theory(DFT) calculations are performed to determine the band alignment of the interface and revealed a type-I heterostructure. The close proximity of the energy levels and the excitonic states in the semiconductors and the coupling of the electronic states with phonons result in the modification of carrier relaxation rates. Modulation of the excitonic absorption states in MoS2 is measured by transient optical pump-probe spectroscopy and the change in emission properties of both semiconductors is measured by steady-state photoluminescence(PL) emission spectroscopy. There is significant red-shift of the C excitonic band and faster dephasing of carriers in MoS2. However, optical excitation at energy higher than the bandgap of both semiconductors slows down the dephasing of carriers and energy exchange at the interface. Enhanced and blue-shifted PL emission is observed in MoS2. Ga N band-edge emission is reduced in intensity at room temperature due to increased phonon-induced scattering of carriers in the Ga N layer. Our results demonstrate the relevance of interface coupling between the semiconductors for the development of optical and electronic applications.
出处 《Photonics Research》 SCIE EI CSCD 2019年第12期1511-1520,共10页 光子学研究(英文版)
基金 Office of Naval Research(ONR-MURI N000141310635) National Science Foundation(NSF-EFRI#1741677,NSF EECCS 1351424) AMMPI(Seed Grant) University of North Texas(COS Seed Grant)
  • 相关文献

参考文献1

二级参考文献2

共引文献17

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部