摘要
研究了旋涂转速对于聚丙烯酸薄膜性能的影响,建立了旋涂转速与聚丙烯酸薄膜厚度及均匀性的关系。当旋涂转速由1 000 r/min逐渐提高到5 000 r/min时,聚丙烯酸薄膜的厚度由0.976μm逐渐减小到了0.394μm,薄膜厚度的标准偏差由0.022μm逐渐减小到了0.008μm。此外,基于光刻工艺在旋涂的聚丙烯酸薄膜表面成功制作了多种金图形,验证了聚丙烯酸薄膜作为水溶性牺牲层与光刻工艺的兼容性。
The effects of spin-coating speeds on the properties of polyacrylic acid(PAA) films were systematically studied,and the relationships between the spin-coating speed and the thickness and uniformity of PAA films were investigated. When the speed was increased from 1000 r/min up to5000 r/min,the thickness of PAA films was decreased from 0.976 μm down to 0.394 μm,and the standard deviation of the thickness of PAA films was decreased from 0.022 μm down to 0.008 μm. Moreover,several kinds of Au patterns were successfully fabricated on the surface of spin-coated PAA films based on photolithography techniques, which demonstrates the compatibility of PAA films as a water-soluble sacrificial layer with photolithography techniques.
作者
王泽龙
刘哲
赵欣悦
刘军山
WANG Zelong;LIU Zhe;ZHAO Xinyue;LIU Junshan(Key Laboratory for Micro/Nano Technology and System of Liaoning Province,Dalian University of Technology,Dalian 116024,China)
出处
《机电工程技术》
2019年第10期80-82,共3页
Mechanical & Electrical Engineering Technology
基金
国家自然科学基金资助项目（编号：51875083,51621064）
关键词
聚丙烯酸
旋涂转速
厚度
均匀性
牺牲层
polyacrylic acid(PAA)
spin-coating speed
thickness
uniformity
sacrificial layer
