摘要
针对在〈100〉硅片上采用EPW各向异性腐蚀液制作U形悬臂梁工艺进行研究。因各向异性腐蚀使(111)侧面相交的凸角处出现一些腐蚀速率较高的晶面,使U形悬臂梁凸角掩模下的硅受到侧向腐蚀。对(111)侧面相交的凸角处出现一些腐蚀速率较高的晶面进行掩模补偿,实验制作出300μm×1200μm的U形悬臂梁。在此基础上,对相同尺寸U形悬臂梁和矩形悬臂梁采用ANSYS软件进行特性模拟,给出其应力分布的模拟结果。
The process of making U-shaped cantilever beam with EPW anisotropic etch liquid on silicon chip〈100〉was studied.Due to anisotropic corrosion,some crystal surfaces with high corrosion rate appear at the convex angle of(111)side intersection,the silicon under the convex mask of U-shaped cantilever beam is corroded laterally.Some crystal faces with high corrosion rate at the convex angle of side intersection of(111)were masked to compensate.The experiment produced 300μm×1200μm U-shaped cantilever beam.On this basis,ANSYS software is used to simulate the characteristics of U-shaped cantilever beam and rectangular cantilever beam of the same size,and the simulation results of stress distribution are given.
作者
刘焱
李日东
LIU Yan;LI Ri-dong(The 49th Research Institute of China Electronic Technology Group Corporation,Harbin 150001,China)
出处
《水利科技与经济》
2019年第8期81-84,共4页
Water Conservancy Science and Technology and Economy
关键词
EPW腐蚀液
U形悬臂梁
微电子机械系统
ANSYS软件
EPW corrosive liquid
U-shape cantilever beam
micro-electromechanical systems(MEMS)
ANSYS software
