摘要
观察了经冲裁后2%Si硅钢片边缘的残余应力与磁畴在不同退火温度下的变化情况。使用纳米压痕法测量了其冲裁边缘微区的残余应力变化情况,使用粉纹法观察了硅钢的边缘磁畴。结果表明:随着退火温度升高(675~775℃),实验硅钢的残余应力迅速减小,当退火温度从775℃增加到800℃时,残余应力有所增加,继续升高退火温度(800~925℃),残余应力逐渐减小;由于再结晶过程,实验硅钢的边缘平均晶粒尺寸在退火温度为725~775℃时减小;由磁畴观察发现,当退火温度为775℃左右时,实验硅钢的磁畴主要为180°畴,且畴距均匀,由磁畴理论可知此时此区域磁性能更佳;从残余应力水平看,750~775℃为实验硅钢合适的退火温度;从磁畴结构观察也可以发现,退火温度为775℃左右时实验硅钢冲裁边缘的磁性能恢复效果佳。
The variation of the residual stress and the magnetic domain at different annealing temperatures of 2% Si silicon steel sheet after punching was observed.The residual stress change of the punched edge of the silicon steel was measured by the nanoindentation method,and the edge magnetic domain of the silicon steel was observed by using the Bitter method.The results show that with the increase of the annealing temperature( 675-775 ℃),the residual stress of the experimental silicon steel decreases rapidly,when the annealing temperature increases from 775 ℃ to 800 ℃,the residual stress increases slightly,and then the residual stress decreases gradually after the annealing temperature further increases( 800-925 ℃).Due to the recrystallization process,the average grain size of the punched edge of the experimental silicon steel is reduced at the annealing temperature of 725-775 ℃.The magnetic domain observation shows that when the annealing temperature is about 775 ℃,the magnetic domain of the experimental silicon steel is mainly180° magnetic domain,and the domain distance is uniform.From the residual stress level,the optimum annealing temperature of the experimental silicon steel is 750-775 ℃.It is also found that the magnetic properties of the punched edge of the experimental silicon steel are good when the annealing temperature is about 775 ℃.
作者
欧昊
张祥林
OU Hao;ZHANG Xiang-lin(State Key Laboratory of Materials Processing and Die & Mould Technology, Huazhong University of Science and Technology, Wuhan 430074, China)
出处
《材料热处理学报》
EI
CAS
CSCD
北大核心
2019年第9期95-99,共5页
Transactions of Materials and Heat Treatment
关键词
无取向硅钢
冲裁
退火温度
纳米压痕法
残余应力
粉纹法
磁畴
non-oriented silicon steel
punching process
annealing temperature
nanoindentation
residual stress
bitter method
magnetic domain
