摘要
采用步进投影式光刻机的步进原理控制曝光剂量,制备楔形模斑转换器.分析了不同曝光剂量对侧壁形貌的影响以及最佳的刻蚀参数.实验结果表明:最佳曝光时间为20ms/次,回流温度为160℃,时间为1min,当刻蚀气体及比例为SF6∶He=8∶80时,刻蚀后得到满足需求的样品,且制备方式制作周期短,精度高,与电子束灰度曝光方法相比,具有高效率、低成本等优点.
The stepwise principle of the step projection lithography machine is used to control the exposure dose to prepare a wedge-shaped mode size converter.The effects of different exposure doses on the sidewall morphology and the best etching parameters were analyzed.The experimental results show that the optimum exposure time is 20 ms each time,the reflow temperature is 160 ℃ for 1 min.When the etching gas and the ratio are SF 6 ∶He=8∶80,the sample obtained after etching has good morphology.The preparation method has the advantages of short manufacturing cycle and high precision,and has the advantages of high efficiency and low cost compared with the electron beam gray exposure method.
作者
王筱
孙天玉
房丹
刘俊成
唐吉龙
方铉
王登魁
张宝顺
魏志鹏
WANG Xiao;SUN Tian-yu;FANG Dan;LIU Jun-cheng;TANG Ji-long;FANG Xuan;WANG Deng-kui;ZHANG Bao-shun;WEI Zhi-peng(State Key Laboratory of High Power Semiconductor Laser,School of Science,Changchun University of Science and Technology,Changchun 130022,China;Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou,Jiangsu 215123,China)
出处
《光子学报》
EI
CAS
CSCD
北大核心
2019年第6期77-83,共7页
Acta Photonica Sinica
基金
国家自然科学基金(Nos.11674038,61674021,61574022,61704011)~~
关键词
楔形
模斑转换器
步进式曝光
灰度
刻蚀工艺
Wedge-shaped
Mode size converter
Stepper exposure
Gray scale
Etching process
