摘要
采用大功率脉冲溅射离子镀技术在不同脉宽条件下制备了一组TiN离子镀层,并通过XRD、SEM、AFM等手段对膜层的微观形貌、生长模式及相关力学性能进行了分析研究。结果表明:随着脉宽的增大,TiN膜层的瞬时沉积速率提高,膜层内部的晶化程度逐渐增强,薄膜晶粒尺寸有所增大,微观形貌显示为较典型的TiN(111)三角锥形以及柱状生长,颗粒尺寸及表面粗糙度均随脉宽的延长而增大,膜层整体无明显孔隙等缺陷存在。通过对H/E值的分析可以看出,较小脉宽条件下制备的膜层综合性能较好、可以获得较高的膜层硬度以及较大的硬度-模量比。
A series of TiN films were prepared by high power pulse sputtering with different pulse widths. The morphology, growth pattern and mechanical properties were studied by XRD, SEM, AFM, etc. The results show that the instantaneous deposition rate of TiN films increases, the crystalline degree increases gradually, and the grain size of the films increases with the increase of pulse width. The micro morphology exhibits typical triangular cone and columnar growth of TiN(111) crystal orientation. Both particle size and surface roughness increase with the increase of pulse width. No obvious pores and significant defects exist in the films. Analyses on H/E value show that the films have better comprehensive properties, higher coating hardness, and larger hardness modulus ratio under the condition of small pulse width.
作者
乔泳彭
蒋百灵
丁郁航
张静
Qiao Yongpeng;Jiang Bailing;Ding Yuhang;Zhang Jing(Xi'an University of Technology,Xi'an 710048,China)
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2019年第3期916-922,共7页
Rare Metal Materials and Engineering
基金
国家自然科学基金(52171144)
关键词
脉宽参量
TIN薄膜
纳米晶
微观结构
力学性能
pulse width parameter
TiN films
nano-crystalline
microstructure
mechanical properties
