摘要
分别用钨坩埚和玻璃碳涂层坩埚蒸镀金膜,采用EDS分析金膜表面黑色颗粒的主要成分。对比金膜表面黑色颗粒分布的密度;根据两种坩埚蒸金膜时的物理学特征不同,研究黑色颗粒产生的机理,解释碳玻璃涂层坩埚蒸金黑色颗粒较多的原因;并利用玻璃碳坩埚采取不同的工艺条件进行对比试验,成功减少了金膜表面的黑色颗粒,为教学实验、真空镀膜工艺和集成电路生产领域蒸镀高质量的金膜提供帮助。
To study the formation of black particles in the evaporated gold film,100 nm-thick-gold films were fabricated on to two different substrates from an electron-beam evaporator by using Tungsten crucible and vitreous carbon crucible,respectively.The constituents of black particles were analyzed by Energy Dispersive Spectrometer and the densities of black particles were compared;meanwhile,the mechanisms of black particles formation were studied based on the different physical properties during the evaporation process by using two kind crucibles.And high density of black particles in the gold film was explained by using vitreous carbon crucible.Furthermore,different process parameters were investigated to obtain the gold film with low density of black particles by vitreous carbon crucible,which would benefit to related research fields,such as experimental teaching,optimization of e-beam vacuum deposition process,and the design and manufacture of vacuum deposition instruments.
作者
付学成
权雪玲
王凤丹
李进喜
王英
FU Xuecheng;QUAN Xueling;WANG Fengdan;LI Jinxi;WANG Ying(Advanced Electronics Materials and Devices,Shanghai Jiao Tong University,Shanghai 200240,China)
出处
《实验室研究与探索》
CAS
北大核心
2018年第9期48-51,共4页
Research and Exploration In Laboratory
关键词
电子束蒸发
钨坩埚
碳玻璃坩埚
金膜
黑色颗粒
electron beam evaporation
tungsten crucible
vitreous carbon crucible
gold film
black particles
