摘要
使用离子束溅射法,在熔融石英衬底上沉积Ta_2O_5薄膜,并将Ta_2O_5薄膜置入100℃到500℃的环境中退火.通过XRD、透过率光谱、面吸收测试,研究了热退火温度对Ta_2O_5薄膜折射率与面吸收的影响.总结了退火温度与薄膜折射率与面吸收的对应关系,并给出简单的理论解释.该结论对Ta_2O_5薄膜的制备及光学性能调控提供一定的参考价值.
Ta 2O5 films were deposited onto fused silica substrates by ion beam sputtering.Then the Ta 2O 5 films were annealed from 100℃to 500℃.The structural and optical properties were characterized using X-ray diffraction(XRD),spectrophotometer and photothermal common-path interferometer,respectively.The relationship between annealing temperature and film refractive index and surface absorption is obtained.This conclusion gives some reference value for the preparation of Ta 2O 5 thin films and the regulation of optical properties.
作者
林斯乐
龙博
谢知
LIN Si-le;LONG Bo;XIE Zhi(College of Mechanical and Electronic Engineering,Fujian Agriculture and Forestry University,350001,Fuzhou,Fujian,PRC)
出处
《曲阜师范大学学报（自然科学版）》
CAS
2018年第2期77-80,共4页
Journal of Qufu Normal University(Natural Science)
基金
Scientific Research Development Funds of Fujian Agriculture and Forestry University(107/KF2015096)
