摘要
A series of W1?xAlxN films(0<x<38.6%,mole fraction)were deposited by reactive magnetron sputtering.The composition,microstructure,mechanical properties and oxidation resistance of the films were characterized by EPMA,XRD,XPS,nano-indentation,SEM and HRTEM.The effect of Al content on the microstructure and oxidation resistance of W1?xAlxN films was investigated.The results show that WN film has a face-centered cubic structure.The preferred orientation changes from(111)to(200).The W1?xAlxN films consist of a mixture of face-centered cubic W(Al)N and hexagonal wurtzite structure AlN phases.The hardness of the W1?xAlxN films first increases and then decreases with the Al content increasing.The maximum hardness is36GPa,which is obtained at32.4%Al(mole fraction).Compared with WN film,the W1-xAlxN composite films show much better oxidation resistance because of the formation of dense Al2O3oxide layer on the surface.
采用反应磁控溅射仪制备一系列不同铝含量(0~38.6%,摩尔分数)的W_(1-x)Al_xN复合膜。利用EPMA、XRD、XPS、纳米压痕仪、SEM及HRTEM等对膜组成、显微组织、力学及抗氧化性能进行表征,研究Al含量对WAlN膜显微组织和抗氧化性能的影响。结果表明,WN膜为面心立方结构,W_(1-x)Al_xN膜由面心立方W(Al)N和六方纤锌矿结构AlN组成,具有很强的(111)和(200)取向。其硬度随Al含量增加先增大后减小。当Al含量为32.4%(摩尔分数)时硬度达到最大值,为36 GPa。与WN相比,W_(1-x)Al_xN膜表现出更优的抗氧化性能,这主要归因于表层形成的致密Al_2O_3层。
