摘要
通过紫外激发在氢终止的单晶硅表面制得了十八烯的反应膜 ,并采用接触角测定仪、红外光谱仪、椭圆偏光仪及原子力显微镜等表征了薄膜的结构和摩擦学特性 .结果表明 ,在紫外光照射下 ,十八烯在硅表面通过键合生成有序反应膜 。
The reaction film of octadecene was prepared on hydrogen-terminated single crystal silicon substrate in the presence of ultraviolet irradiation. The resulting ultra-thin reaction film of octadecene was characterized by means of contact angle measurement, thickness measurement, infrared spectrometry, and atomic force microscopy. It was found that the water contact angle increases with the formation of the octadecene reaction film on the Si substrate, while the adhesion energy and friction are decreased. The generation of the ultra-thin film was attributed to the bonding between the unsaturated C=C bond and the dangling Si—H bond by way of free radical reaction. The angle between the carbon chains of the film and the silicon surface is 28.32°. Thus the reaction film is a promising candidate as the surface protection and lubricating film for Si-based components in micro machines. Further work is under way to disclose the fine structure of the ultra-thin film.
出处
《摩擦学学报》
EI
CAS
CSCD
北大核心
2002年第5期399-401,共3页
Tribology
基金
国家自然科学基金资助重点项目 ( 5 0 0 2 30 0 1)
