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Growth of atomically thick transition metal sulfide films on graphene/6H-SiC(0001) by molecular beam epitaxy 被引量:3

Growth of atomically thick transition metal sulfide films on graphene/6H-SiC(0001) by molecular beam epitaxy
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摘要 We report the growth and characterization of atomically thick NbS2, TaS2, and FeS films on a 6H-SiC(0001) substrate terminated with monolayer or bilayer epitaxial graphene. The crystal and electronic structures are studied by scanning tunneling microscopy and reflection high-energy electron diffraction. The NbS2 monolayer is solely in the 2H structure, while the TaS2 monolayer contains both 1T and 2H structures. Charge-density waves are observed in all phases. For the FeS films, the tetragonal structure coexists with the hexagonal one and no superconductivity is observed. We report the growth and characterization of atomically thick NbS2, TaS2, and FeS films on a 6H-SiC(0001) substrate terminated with monolayer or bilayer epitaxial graphene. The crystal and electronic structures are studied by scanning tunneling microscopy and reflection high-energy electron diffraction. The NbS2 monolayer is solely in the 2H structure, while the TaS2 monolayer contains both 1T and 2H structures. Charge-density waves are observed in all phases. For the FeS films, the tetragonal structure coexists with the hexagonal one and no superconductivity is observed.
出处 《Nano Research》 SCIE EI CAS CSCD 2018年第9期4722-4727,共6页 纳米研究(英文版)
关键词 two-dimensional (2D)materials molecular beam epitaxy charge density wave NbS2 TAS FES two-dimensional (2D)materials molecular beam epitaxy charge density wave NbS2 TaS FeS
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