摘要
化学气相沉积(CVD)大尺寸高质量金刚石单晶是近年来在CVD金刚石膜研究领域所取得的重大研究进展之一。迄今为止的研究,绝大多数都是采用微波等离子体CVD,在高腔压下(10~30kPa)进行的。这是因为,在高腔压下,微波等离子体球急剧收缩,从而能够提供高质量金刚石外延生长所需要的高原子氢浓度。借助电弧放电的极高温和旋转电弧设计,直流电弧等离子体喷射(DC Arc Plasma Jet)能够在更大衬底面积范围提供可与之相比拟的原子氢浓度,因此有可能成为一种低成本的CVD金刚石外延生长方法。文章介绍了近年来采用高功率直流电弧等离子体喷射(DC Arc Plasma Jet)生长大尺寸、高质量金刚石单晶的初步研究结果,并介绍了已经取得的进展和存在的问题,以及对未来的展望。
Growth and applications of large size high quality single crystal diamond is one of the most significant progresses in the field of CVD diamond film research in recent years. However, up to now most of the works were done by microwave plasma CVD op erating at high pressures （10-30kPa）. This is because the plasma ball shrinks rapidly at high pressures so that high concentration of atomic hydrogen necessary for the growth of high quality single crystal diamond can be supplied. However, due to the extremely high gas temperature in arc discharging and the design of arc root rotation, compatible high concentration atomic hydrogen can also be supplied by DC Arc Plasma Jet at lower pres sure and over an even larger area. Therefore, it is reasonable to becomeatechnicalmeas ure for the growth of large size single crystal diamond with low cost. In the paper, our primarily results on the growth and application of large size single crystal diamond by DC Arc Plasma Jet are presented. Details in recent progresses, technical problems, as well as the future perspective are discussed.
作者
吕反修
黑立富
李成明
唐伟忠
李国华
郭辉
孙振路
LU Fan-xiu;HEI Li-fu;LI Cheng-ming;TANG Wei-zhong;LI Guo-hua;GUO Hui;SUN Zhen-lu(University of Science and Technology Beijing, Beijing 100083 ,China;Hebei Plasma Diamond Technology Ltd. , Shijiazhuang 510081 ,China)
出处
《超硬材料工程》
CAS
2018年第2期31-40,共10页
Superhard Material Engineering
