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单层MoS_2表面吸附Ag_6团簇电子结构的第一性原理计算 被引量:4

First principles study on electronic properties of monolayer MoS_2 with Ag_6 cluster adsorbing
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摘要 本文运用第一性原理研究了单层MoS_2在S位吸附Ag_6团簇的稳定性、能带结构和态密度.结果表明,Ag_6团簇在S位单点位吸附的稳定性强于双点位吸附、三点位吸附;其中吸附体系禁带中产生了2条杂质能级,原因在于Ag原子与S形成共价键下的施主能级与受主能级;Ag_6团簇在单层MoS_2的吸附导致态密度峰值在费米能级处发生劈裂,说明Ag_6团簇的吸附会增强单层MoS_2的光电特性;单层MoS_2的能带结构可以通过表面吸附Ag_6团簇以及金属团簇进行调控;在实际的生产应用中依据不同的金属团簇吸附于单层MoS_2表面得到需要的的半导体器件. The band structure, density of states and stability of monolayer MoS2 adsorbed Ag6 clusters are studied by first - principles method. It is found that the stability of single site adsorption is stronger than those of double point adsorption and three point adsorption in the monolayer MoS2 adsorbed Ag6cluster systems. All the adsorption systems increase 2 impurity levels in the band gap because of the donor and acceptor levels are formed by covalent bonds between the Ag and S atom. The peak of the density of states splits at the Fermi level in the adsorption systems, which indicates that the adsorption of Ag6 clusters will enhance the photoelectric properties in monolayer MoS2. Meanwhile, the band structure of monolayer MoS2 can be controlled by surface adsorption of Ag6 clusters or metal clusters. In practical applications, we can absorb suitable metal clusters for a wide variety of semiconductor devices in monolayer MoSa.
出处 《原子与分子物理学报》 CAS 北大核心 2018年第1期54-58,共5页 Journal of Atomic and Molecular Physics
基金 重庆市教委科技项目资助(KJ1601128) 重庆市高校微纳米材料工程与技术重点实验室开放课题基金资助(KF2016012) 永川区科委科技项目资助(Ycstc2016cb3001) 教育部大学生创新创业训练计划项目(201510642062)
关键词 Ag6团簇 单层Mo S2 能带结构 态密度 Ag6 clusters Monolayer MoS2 Band structures Density of states
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  • 1Nakamura S;Mukai T;Senoh M.查看详情[J],Applied Physics Letters19941687. 被引量:1
  • 2Wilson R G;Schwartz R N;Abernathy C R;Peartor S J; Newman N; Rubin M; Fu T; Zavada J M.查看详情[J],Applied Physics Letters1994992. 被引量:1
  • 3Steckl A J;Birkhahn R.查看详情[J],Applied Physics Letters19981700. 被引量:1
  • 4Steckl A J;Zavada J M.查看详情[J],MRS Bulletin199933. 被引量:1
  • 5Steckl A J;Heinkenfeld J C;Lee D S;Garter M J; Baker C C; Wang Y; Jones R.查看详情[J],IEEE Journal of Selected Topics in Quantum Electronics2002749. 被引量:1
  • 6Kim J H;Shepherd N;Davidson M;Holloway P H.查看详情[J],Applied Physics Letters2003641. 被引量:1
  • 7Kim J H;Davidson M R;Holloway P H.查看详情[J],Applied Physics Letters20034746. 被引量:1
  • 8Kim J H;Holloway P H.查看详情[J],Journal of Applied Physics20044787. 被引量:1
  • 9Pan X J;Zhang Z X;Jia L;Li H; Xie E Q.查看详情[J],Journal of Alloys and Compounds2008579. 被引量:1
  • 10潘孝军;张振兴;王涛;李晖 谢二庆.查看详情[J]物理学报,20083786. 被引量:1

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