摘要
利用磁控溅射法,在不同工作压强下制备了氧化钨(WO_3)薄膜,研究了工作压强对WO_3膜层微观结构的调控作用,并研究了WO_3膜层微观结构对其电致变色性能的影响。研究结果表明,制备的WO_3薄膜属于非晶相,表面呈峰状结构;随着工作压强的增大,WO_3薄膜膜层微观结构变疏松,电致变色响应时间和循环寿命均减短;在最佳膜层微观结构下,WO_3薄膜光学密度可达0.64,循环寿命达1500周。
By the magnetron sputtering method, the tungsten oxide （WO3） films are prepared under different working pressures. The regulating effect of working pressure on WO3 film mierostructure is studied, and the effect of WO3 film microstructure on its electrochromic performance is also investigated. The study results show that the prepared WO3 film is with an amorphous phase and its surface presents a peak-shaped structure. With the increase of working pressure, the WO3 film microstructure becomes loose, and the electrochromic response time and the cycle lifetime are shorten. Under the optimal film microstructure condition, the optical density of WO3 films is 0.64 and the cycle lifetime is up to 1500 cycles.
出处
《激光与光电子学进展》
CSCD
北大核心
2017年第11期450-457,共8页
Laser & Optoelectronics Progress
基金
国家自然科学基金重点项目(51335002)
关键词
薄膜
微观结构
氧化钨
电致变色性能
thin film
microstructure
tungsten oxide
electrochromic performance
