摘要
分焦平面像素偏振片的单元大小为像素尺寸,能够集成到CMOS相机的像元表面,可以实现多方向同时偏振成像探测。利用电子束曝光和ICP反应离子束刻蚀相结合的工艺技术制备了不同周期和特征尺寸的分焦平面像素偏振片阵列,应用扫描电子显微镜实现了微纳线栅结构的表征。分焦平面偏振成像克服了偏振成像中不能同时成像、系统不稳定的缺陷,能够很好的适应多种复杂的探测环境。
The unit size of the sub-focal plane pixel polarizer is the pixel size,which can be integrated into the pixel surface of the CMOS camera and can realize multi-directional simultaneous polarization imaging detection. The sub-focal plane pixel polarizer arrays with different periods and characteristic sizes were fabricated by a combination of electron beam lithography and ICP reactive ion beam etching. The structure of the micro-nano wire grids was characterized by scanning electron microscopy. The sub-focal plane polarization imaging overcomes the defects that the imaging can not be performed at the same time and the system is unstable in the polarization imaging,and can well adapt to various complicated detection environments.
出处
《黑龙江科学》
2017年第20期38-39,共2页
Heilongjiang Science
关键词
分焦平面
像素偏振片
电子束曝光
反应离子束刻蚀
Sub-focal plane
Polarizing plate
Electron beam exposure
Reactive ion beam etching
