摘要
为了建立厚度为1 nm左右HfO_2超薄膜的光谱椭偏测量方法,采用掠入射X射线反射技术进行国家/地区实验室间比对认证,其膜厚准确量值作为参比值,建立了HfO_2超薄膜的光谱椭偏结构拟合模型。研究了HfO_2超薄膜的光谱椭偏色散模型和拟合参数,最后确定了拟合色散模型为Tauc-Lorentz 3,拟合光谱范围为3.45~4.35 eV,表面污染层孔隙比例为60:40。
In order to establish a reliable thickness-measuring ftting model for approximate 1 nm thickness HfO2 film using spectroscopic elfpsometry, the thickness of a ultrathin HfO2 film was measured by a grazing incidence X-ray reflection diffractometer, which belongs to a part of country/ region interlaboratory comparison and it used as the reference value of elfpsometry model thickness. It investigated the selected dispersion model and fitting parameters of HfO2 film. The results show that the optimized fitting conditions are obtained, and Taue-Lorentz 3 for the dispersion model is selected with wavelength ranging from 3.45 eV to 4. 35 eV and the ratio of the HfO2 to porosity equals 60 ： 40.
出处
《计量学报》
CSCD
北大核心
2017年第5期548-552,共5页
Acta Metrologica Sinica
基金
国家质量基础的共性技术研究与应用重点专项基金(2016YFF0204300)
国家重点研发计划纳米科技重点专项(2016YFA0200901)
关键词
计量学
HfO2超薄膜
纳米尺度
光谱椭偏模型
掠入射X射线反射技术
metrology
ultrathin HfO2 film
nanoscale
spectroscopic ellipsometry model
grazing incidence X-ray reflection method
