摘要
针对磁控溅射制备CrAlN和VN的单层膜以及不同调制周期的CrAlN/VN纳米结构多层膜,采用X射线衍射仪、能谱仪、激光扫描共聚焦显微镜,维氏硬度计和纳米压痕仪对膜层性能进行表征。实验结果表明:CrAlN、VN以及CrAlN/VN多层膜均为面心立方结构,多层膜中VN层沿着CrAlN层共格生长。CrAlN/VN多层膜的硬度依赖于调制周期,在调制周期为10nm时,硬度达到最大值。多层膜的H^3/E^(*2)和韧性在调制周期较小时,更容易受到膜层中子层性能的影响。
CrAlN, VN and CrAlN/VN multilayer films were deposited by reaction magne- tron sputtering system. The films were characterized by X-ray diffraction, energy disperse spectroscopy, confocal laser scanning microscopy, vickers indenter and nano indentation ap- paratus. Results show that the CrAlN, VN and CrAlN/VN multilayer film has fcc structure. In multilayer films, VN layer coherently grows with CrAlN layer. The hardness of CrAlN/ VN multilayer film depends on modulation period, and when the modulation period is 10nm, the hardness of CrAlN/VN multilayer film reaches maximum value. When the modu- lation period of multilayer films is lower, the H3/E ＊ 2 and toughness of films are more easily influenced by single layer.
作者
李大洋
娄长胜
张罡
LI Dayang LOU Changsheng ZHANG Gang(Shenyang Ligong University, Shenyang 110159 ,China)
出处
《沈阳理工大学学报》
CAS
2017年第4期39-43,共5页
Journal of Shenyang Ligong University
