摘要
在传统的波导耦合微波等离子体化学气相沉积装置中引入双基片结构,测量了金刚石沉积过程中的等离子体发射光谱,通过与单基片结构对比,比较研究了双基片对微波等离子体参数的影响。研究表明:在相同金刚石沉积参数下,双基片结构相比于单基片结构下等离子体基团强度更高。其中H_α基团强度远高于单基片台下H_α基团强度;随着甲烷浓度的增加,双基片结构下C_2基团强度上升更加显著,且在相同条件下,双基片结构下C_2与H_α的比值更小,有利于提高金刚石膜的质量。此外,双基片结构下等离子体电子温度较低且随气压的上升而进一步降低。
The conventional microwave plasma chemical vapor deposition （MPCVD） reactor with single substrate was modified with two parallel substrate holders. The impact of the newly-designed double-substrate structure on the plasma behavior was investigated with optical spectroscopy and Raman spectroscopy, and was exemplified by synthesis of diamond thin films. The results show that the reactor with double substrate soutperforms that with a single substrate under the same diamond growth conditions. To be specific,the emission spectral intensity of plasma radicals, H in particular,from the novel double-substrate reactor was much stronger than that from the single substrate reactor. As the methane flowrate increased, the density of C2 radicals markedly increased but the C2/Ha ratio sharply decreased, favorable for quality improvement of diamond films. Moreover,the plasma＇ s electron temperature in the novel reactor, much lower than that in the single substrate reactor, further decreased with an increase of the pressure.
出处
《真空科学与技术学报》
CSCD
北大核心
2017年第5期488-493,共6页
Chinese Journal of Vacuum Science and Technology
基金
国家自然科学基金项目
