摘要
本文采用硫粉和三氧化钼为原料,通过化学气相沉积法在Si/SiO_2基片表面沉积二硫化钼薄膜,通过大量试验证明:将基片进行硫化预处理后,在一定的温度和Ar气流量下,即可制备出三角形貌的二硫化钼薄膜。最后采用扫描电镜、原子力显微镜、拉曼光谱分析对所制备的二硫化钼产品进行表征研究。结果表明:该方法制备得到的产品为二维二硫化钼,晶体形貌为三角形,其厚度小于5 nm,部分可达到1 nm,拉曼光谱进一步验证产品的层数范围。而XPS检测分析确认CVD沉积所得薄膜为二硫化钼。
Using sulfur powder and molybdenum trioxide as raw materials, by chemical vapor deposition method, the molybdenum disulfide thin film was deposited on Si/SiO2 substrate surface. Through a large number of trials, it is showed that：the substrate after sulfide pretreatment, under certain temperature and Ar gas flow rate, the triangle shape molybdenum disulfide thin film was prepared. Finally the molybdenum trioxide products were characterized by Scanning Electron Microscopy （SEM） , Atomic Force Microscopy, Raman Spectroscopy Analysis and X-ray Pho-toelectron Spectroscopy （XPS）. Results show that this was a two-dimensional MoS2 preparation method, the crystal morphology is triangle, thickness is less than 5 nm,especially to lnm. Raman Spectrum Scope further verify the product layer. The XPS analysis confirmed CVD deposition film is molybdenum disulfide.
出处
《中国钼业》
2017年第2期31-35,共5页
China Molybdenum Industry
关键词
二维
二硫化钼
表征
分析
two-dimension
molybdenum disulfide
characterization
analysis
