摘要
ITO靶材目前是金属铟消耗的主要去向,铟含量为74%,锡含量7.5%,矿石粒度破碎至160目。最终确定以下工艺条件:浸出剂HCl的浓度为7.0~7.5mol/L之间,浸出时间为4.0h,铟浸出率达到95%,除杂锌粉用量为溶液锡质量的2.0倍,除杂时间为30~35min,除锡率达到99%,最终铟纯度达到99.9%,突破了从ITO靶材中提取高纯度铟的技术瓶颈。
ITO target materials currently is main to the consumption of metal indium,Indium content is 74%,the tin content is7. 5%,ore particle size to 160 mesh. Ultimately determine the following process conditions： the concentration of HCl leaching agent was 7. 0 ~ 7. 5 mol/L,leaching time was 4. 0 hours,Indium leaching rate of 95%,in addition to 2. 0 times that of the quality of mixed zinc powder dosage for the solution of tin,in the time of 30 to 35 minutes,in addition to tin rate of 99%,final purity indium of 99. 9%,broke the extracted from ITO target materials of high purity indium technology bottleneck.
作者
刘猛
杨飞
黄文孝
吴金玲
Liu Meng Yang Fei Huang Wenxiao Wu Jirding(Guangdong Institute of Mineral Resources Application Metallurgical laboratory, Shaoguan 512026,China)
出处
《山东化工》
CAS
2017年第6期18-19,22,共3页
Shandong Chemical Industry
基金
国土资源部放射性与稀有稀散矿产综合利用重点实验室开放基金项目(KYSKFJJ201501)
关键词
ITO靶材
高纯度铟
实验研究
ITO target materials
High purity indium
Experiment research
