摘要
CVD金刚石因其优越的物理化学特性被应用到许多高科技领域中,但目前的抛光方法存在着效率低、精度差等诸多问题,无法满足高科技领域对金刚石高效超光滑的表面精度要求。我们提出利用二氧化钛光催化辅助化学机械抛光方法实现CVD金刚石的高质量加工,并研制出用于金刚石抛光的二氧化钛光催化氧化原理结合辅助化学机械抛光液。首先,我们根据光催化原理搭建相应的化学机械抛光装置;然后,采用甲基橙溶液氧化变色及溶液氧化还原电位(ORP)表征抛光液的氧化性;最后,对CVD金刚石进行了光催化辅助化学机械抛光。结果表明:P25型二氧化钛光催化活性最高,每100mL纯水中加入1mL的H_2O_2与0.2mL的H_3PO_4对催化剂活性影响最大,氧化还原能力较高,采用其加工CVD金刚石可使抛光表面变得极为光滑。
CVD diamond has been widely applied in various fields.Despite several existing processing methods,many problems,such as low efficiency and poor precision,still arise in actual applications.To avoid the problems of the existing methods for polishing diamond,this study prepares a new type of slurry for polishing diamond using TiO_2 photocatalytic oxidation theory.Firstly,the apparatus is set up according to the mechanism of photocatalytic oxidation.Then,the slurry is characterized with the methyl orange solution and the oxidation-reduction potential（ORP）analyzer.Finally,the CVD diamond is polished with the photocatalytic assisted chemical mechanical polishing method.The results show that P25 TiO_2 photocatalytic shows the best oxidation activity.The effect on catalyst activity is obvious when adding 1mL of H_2O_2 and 0.2mL of H_3PO_4 per 100mL water,and the oxidation ability is the best.The CVD diamond is polished smoothly by using the new slurry.
出处
《金刚石与磨料磨具工程》
CAS
2016年第5期15-20,31,共7页
Diamond & Abrasives Engineering
基金
国家自然科学基金项目(51305278)
中国博士后基金面上项目(2014M551124)
沈阳市科技项目(F16–205–1–10)
